◆nanoPVD-T15A◆ High-performance organic and metal film deposition device
Ideal for organic thin film deposition applications such as OLED, OPV, and OTFT. Utilizes low-temperature organic deposition sources with excellent temperature responsiveness/stability and deposition sources for metal films.
PLC automatic control with easy touch panel operation, centralized management of various settings. An intuitive HMI that allows anyone to operate without complicated procedures. Connects to a PC via USB cable, logs and saves CSV files, and creates, registers, and saves film formation recipes.
◉ Compact size: 804(W) x 530(D) x 600(H)mm
◉ Weight: 40kg to 70kg (depending on equipment configuration)
◉ Excellent basic performance
- Achievable vacuum level 5x10-5 Pascal
- Equipped with high-performance turbo molecular pump
- Φ2 inch or Φ4 inch substrates
◉ Deposition sources
- Resistance heating deposition source TE x up to 2 units
- Organic deposition source LTE x up to 4 units (if mixed with resistance heating TE, up to 2 units)
◉ 7" touch panel
◉ Continuous film formation
- Automatic control of film formation programs
- Registration of 30 types of recipes
- High-precision wide-range vacuum gauge
◉ Abundant options
- Substrate rotation
- Up and down movement with 300mm stroke
- Substrate shutter
- Dry pump (RP standard)

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Compact and High Performance High-Performance Organic and Metal Film Deposition System
◉ Φ2inch・Φ4inch Substrates
◉ Compact Size: 804(W) x 560(D) x 600(H)mm











