◇◆◇ nanoPVD-S10A Magnetron Sputtering Device ◇◆◇

This is a research and development RF/DC magnetron sputtering device. Despite its high performance and multifunctionality, it fits into limited laboratory space with its compact size and easy operation via a 7-inch front touch panel.
● Achievable pressure: 5x10^-5 Pa (*fastest 30 minutes up to 1x10^-4 Pa!)
● Film uniformity: ±3%
● Various options: Up/down rotation, heater, cathode for magnetic materials, and more
● 3-source cathode + 3 MFC systems, with additional RF/DC power supply for versatile applications such as multilayer films and simultaneous deposition.
- Insulating films
- Conductive films
- Compounds, and more
【Main Features】
◉ Compatible substrates: 2" (up to 3 sources) or 1" (1 source)
◉ 2" cathode x up to 3 sources
◉ Easy operation via touch panel with PLC automatic program control
◉ High-precision APC process control with MFC
◉ Up to 3 MFC systems
◉ USB port for Windows PC connection, capable of creating and saving recipes for up to 1000 layers and 50 films. Live data logging on PC.
◉ Vacuum system: TMP + RP (*dry pump option)
◉ Substrate rotation, up/down movement, heating (Max 500℃)
◉ Quartz crystal film thickness monitor/controller

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High-performance RF/DC magnetron sputtering system
3-source continuous multilayer film, 2-source simultaneous film deposition, APC automatic pressure control
◉ Achievable pressure < 5x10^-7 mbar
◉ Maximum 3 sources Φ2