◆nanoPVD-T15A◆ High-performance organic and metal film deposition device
Ideal for organic thin film deposition applications such as OLED, OPV, and OTFT. It employs a low-temperature organic deposition source with excellent temperature responsiveness/stability and a high-temperature deposition source for metal films.
A vacuum deposition system for R&D with fully automatic PLC control and excellent operability and maintainability, operated via a simple touch panel. An intuitive HMI that requires no complicated operating procedures, allowing anyone to operate it easily. Connects to a PC via USB cable for log saving and creating and storing automatic film deposition recipes.
◉ Compact size: 804(W) x 530(D) x 600(H)mm
◉ Weight: 40kg to 70kg (depending on equipment configuration)
◉ Excellent basic performance
- Achievable vacuum level: 5x10-5 Pascal
- Equipped with a high-performance turbo molecular pump
- Φ2 inch or Φ4 inch substrates
◉ Deposition sources
- Resistance heating deposition source TE x up to 2 units
- Organic deposition source LTE x up to 4 units (if mixed with resistance heating TE, up to 2 units)
◉ 7" touch panel
◉ Continuous film deposition
- Automatic control of deposition programs
- 30 types of registered recipes
- High-precision wide-range vacuum gauge
◉ Abundant options
- Substrate rotation
- Up and down movement with a 300mm stroke
- Substrate shutter
- Dry pump (RP standard)

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