Analysis software(3d) - List of Manufacturers, Suppliers, Companies and Products

Last Updated： Aggregation Period:Oct 29, 2025～Nov 25, 2025
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Analysis software Product List

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Magnetron Sputtering Analysis Software 'Particle-PLUS'

Magnetron Sputtering Analysis Software 'Particle-PLUS'

"Particle-PLUS" is a plasma and rarefied fluid analysis software that specializes in magnetron sputtering devices using the particle method.

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It excels in low-pressure plasma analysis. - It can perform advanced physical model analyses such as CCP and external circuit models. - It specializes in plasma simulations in low-pressure gases, where fluid modeling is challenging. - It supports 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing efficient analysis of complex models. - As a strength of our in-house developed software, it can perform standard CCP and magnetron sputtering calculations, as well as customization to fit customer devices. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

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[Example] 'Particle-PLUS' Cylindrical Magnetron Device

[Example] 'Particle-PLUS' Cylindrical Magnetron Device

An example of "Particle-PLUS" analysis of magnetron sputtering using a cylindrical target, which is one method for forming a strong film on the inside of a long cylinder.

"Particle-PLUS" is a simulation software suitable for the research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, it can quickly obtain results without the need for full device simulations. - It excels in plasma simulations for low-pressure gases, where calculations using fluid models are challenging. - It supports 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing for efficient analysis of complex models. - As a strength of our in-house developed software, customization to fit the customer's device is also possible. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Electron and ion density distribution/temperature distribution/generation distribution - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

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[Example] Particle-PLUS Opposing Target Sputter

[Example] Particle-PLUS Opposing Target Sputter

Introduction of analysis examples using "Particle-PLUS": "Opposing Target Sputtering"

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, it can quickly obtain results without the need for full device simulations. - It excels in plasma simulations of low-pressure gases, where calculations using fluid models are challenging. - It supports 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing efficient analysis even for complex models. - As a strength of our in-house developed software, customization to fit the customer's device is also possible. ◆ Supports various applications ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

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[Example] Particle-PLUS 2 Frequency CCP

[Example] Particle-PLUS 2 Frequency CCP

Introduction of analysis examples using "Particle-PLUS" Particle-PLUS also allows for the calculation of overlapping two-frequency CCP.

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, it can quickly obtain results without the need for full device simulations. - It excels in plasma simulations for low-pressure gases, where calculations using fluid models are challenging. - It supports 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing for efficient analysis of complex models. - As a strength of our in-house developed software, customization to fit the customer's device is also possible. ◆ Supports various applications ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Electron and ion density distribution/temperature distribution/generation distribution - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Neutral gas density distribution/temperature distribution/velocity distribution, etc. *Please feel free to contact us for more details.

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[Example] "Particle-PLUS" Counter Target Sputtering

[Example] "Particle-PLUS" Counter Target Sputtering

Introduction of Particle-PLUS Analysis Case: "Simulation Case of Al Thin Film Fabrication Using Face-to-Face Target"

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, it can quickly obtain results without the need for full device simulations. - It excels in plasma simulations for low-pressure gases, where calculations with fluid models are challenging. - It supports both 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing for efficient analysis of complex models. - As a strength of our in-house developed software, customization to fit the customer's equipment is also possible. ◆ Supports various applications ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *Please feel free to contact us for more details.

  • Scientific Calculation and Simulation Software
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[Example] Mass analysis of the "Particle-PLUS" ion beam.

[Example] Mass analysis of the "Particle-PLUS" ion beam.

Introduction to Particle-PLUS Analysis Examples: "Ion Beam Mass Analysis and Electrostatic Acceleration" Simulation Case Study

"Particle-PLUS" is a simulation software suitable for the research, development, and manufacturing of devices and materials using plasma. - It excels in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, results can be obtained quickly without the need for full device simulations. - It specializes in plasma simulations in low-pressure gases, where calculations with fluid models are challenging. - It supports 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing for efficient analysis of complex models. - As a strength of our in-house developed software, customization to fit the customer's equipment is also possible. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitive coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

  • Scientific Calculation and Simulation Software
  • Other Software
  • Other analytical equipment

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[Example] "Particle-PLUS" RF Magnetron Sputtering

[Example] "Particle-PLUS" RF Magnetron Sputtering

Introduction to Particle-PLUS Analysis Case: "RF Magnetron Sputtering Analysis" Simulation Case

This is an analysis case of RF magnetron sputtering, which is one of the film deposition methods using process plasma. Particle-PLUS specializes in plasma analysis within vacuum chambers and can perform simulations of deposition rates and other parameters at high speed. ◇ Features of 'Particle-PLUS' - Excels in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, it can obtain results quickly without the need for full device simulations. - Specializes in plasma simulations for low-pressure gases, where fluid modeling is difficult. - Supports 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing efficient analysis even for complex models. - As a strength of our in-house developed software, customization to fit customer devices is also possible. ◆ Various calculation results can be output ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas and more. *Please feel free to contact us for more details.

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[Case Study] Particle-PLUS: RF Magnetron for Dielectric Targets

[Case Study] Particle-PLUS: RF Magnetron for Dielectric Targets

Particle-PLUS Analysis Case Introduction: "RF Magnetron Sputtering Analysis of Dielectric Targets" Simulation Case

This is an analysis case of RF magnetron sputtering, which is one of the film deposition methods using process plasma. Particle-PLUS specializes in plasma analysis within vacuum chambers and can perform simulations of deposition rates and more at high speed. ◇ Features of 'Particle-PLUS' - Excels in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, results can be obtained quickly without the need for full device simulations. - Specializes in plasma simulations in low-pressure gases, where calculations with fluid models are challenging. - Supports 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing for efficient analysis of complex models. - As a strength of our in-house developed software, customization to fit the customer's equipment is also possible. ◆ Various calculation results can be output ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Density distribution/temperature distribution/velocity distribution of neutral gas and more. *Please feel free to contact us for more details.

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3D rarefied fluid analysis software "DSMC-Neutrals"

3D rarefied fluid analysis software "DSMC-Neutrals"

Analysis of gas flow under low-pressure conditions. Analysis software compatible with rarefied gases (rarefied fluids).

**Features** - By adopting an unstructured mesh, it is possible to compute the exact shape of complex real devices. - High parallel efficiency allows for quick computation results even for large-scale shapes. - Since it employs a particle method, unlike fluid models, it can achieve a converged solution even with poor-quality computational grids. - With comprehensive technical support, even those new to simulation or busy with experiments can reliably obtain results. **Supports Various Cases** - Simulation of rarefied gas flow in a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Chemical vapor deposition (CVD), organic light-emitting diode (OLED), molecular beam epitaxy (MBE). - Film deposition simulations that include chemical reactions like CVD. **Outputs Various Calculation Results** - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculations of dissociation, recombination, and molecular (atomic) exchange reactions. - Multiple reaction equations can be set up on the GUI. *For more details, please refer to the catalog or feel free to contact us.*

  • Scientific Calculation and Simulation Software
  • Analysis and prediction system

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CCP simulation analysis software "Particle-PLUS"

CCP simulation analysis software "Particle-PLUS"

"Particle-PLUS" is a plasma and rarefied fluid analysis software that is also skilled in 2-frequency CCP analysis using the particle method.

"Particle-PLUS" is a simulation software suitable for research and development of devices using plasma, compatible with CCP. - Excels in plasma simulation for low-pressure gases, where fluid modeling is challenging. - Advanced physical model analysis, including CCP and external circuit models. - Supports 2D and 3D, efficiently analyzing even complex models. - As a strength of our in-house developed software, it offers standard functions for CCP and magnetron sputtering calculations, as well as customization to fit customer devices. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitive Coupled Plasma (CCP) - Dielectric Barrier Discharge (DBD), etc. ◆ Outputs various calculation results ◆ - Potential distribution - Electron and ion density distribution/temperature distribution/generation distribution - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Neutral gas density distribution/temperature distribution/velocity distribution, etc. *For more details, please feel free to contact us at information@wavefront.co.jp.

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Analysis software for CVD equipment 'Particle-PLUS'

Analysis software for CVD equipment 'Particle-PLUS'

"Particle-PLUS" is a plasma and rarefied fluid analysis software that excels in 2-frequency CCP analysis using the particle method.

"Particle-PLUS" is a simulation software suitable for research and development of devices and equipment using plasma, compatible with CCP. - Excels in simulating low-pressure gases where fluid models are difficult to compute. - Advanced physical model analysis including CCP and external circuit models. - Supports 2D (two-dimensional) and 3D (three-dimensional) analysis, efficiently handling complex models. - As a strength of our in-house developed software, it not only includes standard functions for CCP and magnetron sputtering calculations but also allows customization to fit customer equipment. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD), etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us at information@wavefront.co.jp.

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Supports ICP: Analysis Software 'Particle-PLUS'

Supports ICP: Analysis Software 'Particle-PLUS'

"Particle-PLUS" is a plasma and rarefied fluid analysis software that excels in ICP and CCP analysis using particle methods.

"Particle-PLUS" is software suitable for research and development of devices using plasma, compatible with ICP and CCP. - Excels in simulations of low-pressure gases where fluid modeling is challenging - Calculation functions for inductive heating for ICP simulations - Advanced physical model analysis such as CCP and external circuit models - Capable of simultaneously simulating ICP and CCP - Supports 2D and 3D, efficiently analyzing complex models - As a strength of our in-house developed software, customization to fit customer devices is possible ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD), etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Density distribution/temperature distribution/velocity distribution of neutral gas and more *For more details, please feel free to contact us. sales@wavefront.co.jp

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[Case] 'Particle-PLUS' RF Magnetron Sputtering

[Case] 'Particle-PLUS' RF Magnetron Sputtering

An example of the 'Particle-PLUS' analysis of RF magnetron sputtering, which is one of the film formation methods for dielectric films using process plasma.

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It specializes in plasma analysis within vacuum chambers and can perform simulations of film deposition rates at high speed. - It excels in low-pressure plasma analysis. - It is proficient in plasma simulations in low-pressure gases, where calculations using fluid models are challenging. - It supports 2D and 3D, allowing for efficient analysis even with complex models. - As a strength of our in-house developed software, customization to fit the customer's equipment is also possible. ◆ Supports various applications ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitive coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

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[Example] 'Particle-PLUS' DC Magnetron Sputter

[Example] 'Particle-PLUS' DC Magnetron Sputter

A case study of the DC magnetron sputtering method using process plasma, known as 'Particle-PLUS'.

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - It excels in plasma analysis within vacuum chambers, enabling high-speed simulations of film deposition rates and more. - It is proficient in plasma simulations in low-pressure gases, where calculations using fluid models are challenging. - It supports 2D and 3D, allowing for efficient analysis of complex models. - As a strength of our in-house developed software, customization to fit the customer's equipment is also possible. ◆ Supports various applications ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitive coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Electron and ion density distribution/temperature distribution/generation distribution - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Neutral gas density distribution/temperature distribution/velocity distribution, etc. *For more details, please feel free to contact us.

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[Case Study] Plasma Analysis of "Particle-PLUS" Dual Frequency CCP

[Case Study] Plasma Analysis of "Particle-PLUS" Dual Frequency CCP

Introduction to Particle-PLUS Analysis Case: "Plasma Analysis of Dual Frequency CCP" Simulation Case

This is a case study on plasma analysis of CCP (Capacitively Coupled Plasma) devices. Particle-PLUS specializes in plasma analysis within vacuum chambers and can perform high-speed simulations even when multiple electrodes are present or when applying overlapping frequencies. ◇ Features of 'Particle-PLUS' - Excels in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, it can quickly obtain results without the need for full device simulations. - Specializes in plasma simulations for low-pressure gases, where calculations using fluid models are challenging. - Supports 2D (two-dimensional) and 3D (three-dimensional) analyses, efficiently handling complex models. - As a strength of our in-house developed software, customization to fit the customer's device is also possible. ◆ Various calculation results can be output ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas and more. *For more details, please feel free to contact us.

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