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Non-destructive analysis using magnetic field microscopy and 3D X-ray microscopy.

Analysis of low-resistance short defects, which was difficult with previous non-destructive testing, is now possible!

The magnetic field microscope is a non-destructive analysis technique that measures the magnetic field distribution generated by electric currents from outside the measurement target and estimates the current paths flowing within the measurement target. By observing abnormal areas such as shorts identified by the magnetic field microscope with a 3D X-ray microscope (X-ray CT), detailed cause analysis can be performed non-destructively. Please feel free to contact us when you need our services. 【Analysis Flow】 1. Abnormal detection using the magnetic field microscope 2. Observation using the 3D X-ray microscope *For more details, please refer to the PDF document or feel free to contact us.

  • Other services and technologies

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Analysis of the etch pit shape on SiC wafers

Introducing a case where etch pits formed on SiC wafers were observed using a 3D X-ray microscope (X-ray CT)!

In order to promote the spread of power semiconductors, the development of low-defect SiC wafers is underway. X-ray CT is a non-destructive method that visualizes the shape of materials in three dimensions and allows for quantitative evaluation. In the PDF document, you can view the CT images obtained when observing the etch pits formed on SiC wafers using a 3D X-ray microscope (X-ray CT). [Overview] ■ Shape analysis of etch pits using X-ray CT *For more details, please refer to the PDF document or feel free to contact us.

  • Non-destructive testing

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