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  6. Detection sensitivity due to differences in acceleration voltage during SEM-EDX analysis.

Detection sensitivity due to differences in acceleration voltage during SEM-EDX analysis.

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last updated:Mar 29, 2021

アイテス
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Appropriate acceleration conditions for accurate analysis results! The detection depth in EDX changes with different acceleration voltages!

This introduces the detection sensitivity related to differences in acceleration voltage during SEM-EDX analysis. When analyzing the gold-plated surface of a typical printed circuit board (PCB), there are cases where the underlying nickel is detected even though it is not exposed. This is related to the scattering depth of the electron beam, and it is necessary to set appropriate acceleration conditions to obtain accurate analysis results. In this study, we conducted a verification of the EDX detection depth based on differences in acceleration voltage using Monte Carlo simulations. This is just one example, but it is important to set the acceleration voltage while imagining how electrons are scattered in order to obtain accurate analysis results. [Test Board Overview] - The sample used was a gold-plated pad from a typical printed circuit board (PCB). - The layer structure consists of nickel plating and gold plating on copper wiring. - The thickness of the gold plating, as observed in cross-section, is 212 nm. *For more details, please refer to the PDF document or feel free to contact us.*

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Detection sensitivity due to differences in acceleration voltage during SEM-EDX analysis.

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【EDX Analysis Results】 - At an acceleration voltage of 10kV, Ni beneath the Au plating is not detected, but at an acceleration voltage of 12kV or higher, the underlying Ni is detected. - The reason for detecting the information from the underlying layer when increasing the acceleration voltage has been confirmed through Monte Carlo simulation. *For more details, please refer to the PDF document or feel free to contact us.

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Detection sensitivity due to differences in acceleration voltage during SEM-EDX analysis.

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Differences in appearance due to SEM observation conditions.

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Changes due to differences in acceleration voltage during EDX analysis.

Changes due to differences in acceleration voltage during EDX analysis.

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Basic Analytical Methods for Similar but Different Objects

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[Example of TOF-SIMS] Analysis of Li

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Aites was established in 1993, originating from the quality assurance department of the IBM Japan Yasu office. Based on the technical expertise cultivated through cutting-edge defect analysis and reliability assurance of electronic components at the IBM Japan Yasu office, we have provided various products and services that support the development and manufacturing of semiconductors, displays, organic EL, solar cells, and electronic components to customers both domestically and internationally.

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