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  6. Backside light emission analysis of SiC devices

Backside light emission analysis of SiC devices

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last updated:Nov 16, 2020

アイテス
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Pre-processing of SiC devices → Identification of leakage points → Physical analysis/component analysis handled seamlessly!

Our company conducts "Backside Emission Analysis of SiC Devices." SiC is a power device that has less energy loss compared to conventional Si semiconductors and is attracting attention. However, since its physical properties differ from those of Si semiconductors, new methods are required for failure analysis. In a case study of backside emission analysis of SiC MOSFETs, an overseas SiC MOSFET was subjected to ESD, creating a G-(D,S) leakage, and numerous emissions indicating the leakage points were detected through emission analysis. When the emission points were observed using TEM, damage to the SiO2 film and the SiC crystal was noted. *For more details, please refer to the PDF document or feel free to contact us.

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2020-08-18_14h27_07.png

Backside light emission analysis of SiC devices

2020-08-18_14h27_07.png
2020-08-18_14h27_07.png
  • Related Link - https://www.ites.co.jp/analyze/index.html

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Backside light emission analysis of SiC devices

Backside light emission analysis of SiC devices

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Back surface polishing of semiconductors for luminescence analysis

Back surface polishing of semiconductors for luminescence analysis

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Total solution service for power devices.

Total solution service for power devices.

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Announcement of the introduction of Talos F200E

Announcement of the introduction of Talos F200E

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Specification verification and failure analysis through reliability testing.

Specification verification and failure analysis through reliability testing.

TECHNICAL
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TEM observation of PL emission sites in SiC.

TEM observation of PL emission sites in SiC.

TECHNICAL
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Reliability evaluation and failure analysis of joints through power cycle testing.

Reliability evaluation and failure analysis of joints through power cycle testing.

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Announcement of the introduction of Talos F200E

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Our company will introduce the FEI "Talos F200E" transmission electron microscope system. Compared to conventional models, the resolution for TEM and STEM has been improved, and performance has been significantly enhanced, allowing for EDS analysis with four detectors. Additionally, it is equipped with features such as drift-corrected frame integration (DCFI), which integrates multiple frames while correcting for drift.

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Aites was established in 1993, originating from the quality assurance department of the IBM Japan Yasu office. Based on the technical expertise cultivated through cutting-edge defect analysis and reliability assurance of electronic components at the IBM Japan Yasu office, we have provided various products and services that support the development and manufacturing of semiconductors, displays, organic EL, solar cells, and electronic components to customers both domestically and internationally.

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