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  6. OBIRCH analysis of SiC devices using short-wavelength lasers.

OBIRCH analysis of SiC devices using short-wavelength lasers.

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last updated:Nov 16, 2020

アイテス
アイテス
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Since semiconductors have different physical properties, new methods are required for failure analysis!

Our company conducts OBIRCH analysis of SiC devices using short-wavelength lasers. SiC is a power device with lower energy loss compared to conventional Si semiconductors and is attracting attention. However, since its physical properties differ from those of Si semiconductors, new methods are required for failure analysis. In the backside OBIRCH analysis of SiC-SBD using short-wavelength lasers, localized melting damage was induced in the SiC Schottky barrier diode, resulting in the generation of a pseudo-leak. Locations of pseudo-leaks that could not be confirmed in the IR-OBIRCH analysis were clearly observed in the GL-OBIRCH analysis. *For more details, please refer to the PDF materials or feel free to contact us.

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2020-08-18_14h13_51.png

OBIRCH analysis of SiC devices using short-wavelength lasers.

2020-08-18_14h13_51.png
2020-08-18_14h13_51.png
  • Related Link - https://www.ites.co.jp/analyze/index.html

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OBIRCH analysis of SiC devices using short-wavelength lasers.

OBIRCH analysis of SiC devices using short-wavelength lasers.

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Back surface polishing of semiconductors for luminescence analysis

Back surface polishing of semiconductors for luminescence analysis

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Total solution service for power devices.

Total solution service for power devices.

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Announcement of the introduction of Talos F200E

Announcement of the introduction of Talos F200E

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Specification verification and failure analysis through reliability testing.

Specification verification and failure analysis through reliability testing.

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TEM observation of PL emission sites in SiC.

TEM observation of PL emission sites in SiC.

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Announcement of the introduction of Talos F200E

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Our company will introduce the FEI "Talos F200E" transmission electron microscope system. Compared to conventional models, the resolution for TEM and STEM has been improved, and performance has been significantly enhanced, allowing for EDS analysis with four detectors. Additionally, it is equipped with features such as drift-corrected frame integration (DCFI), which integrates multiple frames while correcting for drift.

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Aites was established in 1993, originating from the quality assurance department of the IBM Japan Yasu office. Based on the technical expertise cultivated through cutting-edge defect analysis and reliability assurance of electronic components at the IBM Japan Yasu office, we have provided various products and services that support the development and manufacturing of semiconductors, displays, organic EL, solar cells, and electronic components to customers both domestically and internationally.

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