The analysis sensitivity of TOF-SIMS is high at the ppm level, making it effective for analyzing trace contamination!
This is an introduction to a case where water droplet-shaped contaminants were created on a Si wafer through reproducibility experiments. Measurements were conducted at the same location using SEM-EDX and TOF-SIMS, and a comparison of the image maps was made. In the TOF-SIMS image map, organic substances (CH, CN), Na, and K were detected around the watermark. While no contaminants were observed around the watermark in the optical image, SEM image, and EDX analysis, the TOF-SIMS image map revealed that trace amounts of contaminants were present. *For more details, please refer to the PDF document or feel free to contact us.*
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Aites was established in 1993, originating from the quality assurance department of the IBM Japan Yasu office. Based on the technical expertise cultivated through cutting-edge defect analysis and reliability assurance of electronic components at the IBM Japan Yasu office, we have provided various products and services that support the development and manufacturing of semiconductors, displays, organic EL, solar cells, and electronic components to customers both domestically and internationally.