"Particle-PLUS" is a plasma and rarefied fluid analysis software that is also skilled in 2-frequency CCP analysis using the particle method.
"Particle-PLUS" is a simulation software suitable for research and development of devices using plasma, compatible with CCP. - Excels in plasma simulation for low-pressure gases, where fluid modeling is challenging. - Advanced physical model analysis, including CCP and external circuit models. - Supports 2D and 3D, efficiently analyzing even complex models. - As a strength of our in-house developed software, it offers standard functions for CCP and magnetron sputtering calculations, as well as customization to fit customer devices. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitive Coupled Plasma (CCP) - Dielectric Barrier Discharge (DBD), etc. ◆ Outputs various calculation results ◆ - Potential distribution - Electron and ion density distribution/temperature distribution/generation distribution - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Neutral gas density distribution/temperature distribution/velocity distribution, etc. *For more details, please feel free to contact us at information@wavefront.co.jp.
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basic information
**Features** - The time scheme uses an implicit method, allowing for stable time evolution calculations over a large time step Δt compared to conventional methods. - The collision reaction model between neutral gas and electrons and ions employs the Monte Carlo Scattering method, enabling accurate and rapid calculations of complex reaction processes. - The neutral gas module determines the initial neutral gas distribution used in the plasma module above, allowing for quick evaluation of gas flow using the DSMC method. - The sputtered particle module calculates the behavior of atoms sputtered from the target in plasma and neutral gas environments, such as the flux distribution on opposing substrates, which can be evaluated quickly. *For other functions and details, please feel free to contact us.*
Price range
Delivery Time
P4
Applications/Examples of results
【Dual Frequency Capacitive Coupled Plasma】 - Optimization of voltage and other parameters to achieve high-density plasma - Damage to chamber walls - Optimization of power using external circuit models - It is possible to apply voltages to the electrode plates that align with real devices - The waveform of the applied voltage can be simulated smoothly and at relatively realistic voltages - Calculations are relatively stable to avoid applying unreasonable voltages 【DC Magnetron Sputtering】 - Uniformity of erosion dependent on magnetic field distribution - Adsorption distribution of sputtered materials on the substrate 【Pulsed Voltage Magnetron Sputtering】 - Optimization of the application time of pulsed voltage to efficiently sputter materials 【Ion Implantation】 - The influence of the substrate on the erosion distribution 【Time Evolution of Applied Voltage on Electrode Plates】 - It is possible to observe physical quantities that are difficult to measure experimentally, such as electron density and ion velocity distribution - By investigating electron density and ion velocity distribution, it is possible to examine the uniformity of the film and damage to the chamber walls - It is possible to optimize the generation of high-density plasma at low power by changing calculation conditions
Detailed information
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2) 2-frequency CCP (with external circuit) analysis _ electron temperature
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3) 2-frequency CCP (with external circuit) analysis_potential
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4) 2-Phase CCP (with external circuit) Analysis_Average Speed
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5) 2-frequency CCP (with external circuit) analysis_ Average speed of electrons
catalog（14）
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![[Case Study] CCP Plasma Simulation Using the Particle-PLUS External Circuit Model](https://image.www.ipros.com/public/catalog/image/01/d15/513467/IPROS49127693160706889091.jpeg?w=120&h=170)
![[Case Study] Particle-PLUS Cylindrical Magnetron Device Plasma Sputtering Simulation](https://image.www.ipros.com/public/catalog/image/01/28d/513469/IPROS57753432477912697050.jpeg?w=120&h=170)
![[Case Study] Particle-PLUS DC Magnetron Sputtering Simulation](https://image.www.ipros.com/public/catalog/image/01/426/513472/IPROS31362668036278405479.jpeg?w=120&h=170)
![[Case Study] Particle-PLUS DC Magnetron Sputtering (3D Calculation) Simulation](https://image.www.ipros.com/public/catalog/image/01/600/513473/IPROS14341653820382667928.jpeg?w=120&h=170)
![[Case Study] Particle-PLUS Counter-Target Sputtering Simulation](https://image.www.ipros.com/public/catalog/image/01/33c/513474/IPROS71008523339880745470.jpeg?w=120&h=170)
![[Case Study] Particle-PLUS Opposing Target Sputtering Simulation](https://image.www.ipros.com/public/catalog/image/01/86c/513475/IPROS47056299894055276861.jpeg?w=120&h=170)
![[Case Study] Particle-PLUS RF Magnetron Sputtering Simulation](https://image.www.ipros.com/public/catalog/image/01/bb3/513673/IPROS35622406148691072631.jpeg?w=120&h=170)
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Company information
Our company develops and sells a "Maintenance Management System" for managing and operating various plants, factories, and other facilities and assets. Currently, this system is undergoing significant evolution into a system that incorporates IoT technologies, such as sensor information and input from tablet devices, as well as AI technologies like machine learning, featuring functions for failure prediction and automatic scheduling. Additionally, as part of the recent trend of digital transformation (DX), there is a growing movement to digitize and automate manufacturing processes and research and development sites in factories to improve operational efficiency. In line with this trend, our company provides a solution aimed at enhancing efficiency in research and development environments, which is the Laboratory Information Management System (LIMS). This software includes features such as workflow management, data tracking, data management, data analysis, and integration of electronic lab notebooks.
![[Example] Particle-PLUS 2 Frequency CCP](https://image.www.ipros.com/public/product/image/f09/2000513669/IPROS24703150742825763228.png?w=280&h=280)
