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  3. ウェーブフロント 本社
  4. Handling CAE Solutions
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  • Nov 16, 2018
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Nov 16, 2018

Handling CAE Solutions

ウェーブフロント ウェーブフロント 本社
A rich lineup of "CAE solutions" available in various fields ■ Plasma Solutions - Low-temperature plasma analysis [VizGlow] Analyzes plasma under various conditions using a compressible fluid model. - Thermal plasma analysis [VizSpark] Analyzes heat generated by arc plasma and the resulting temperature rise. - Particle method plasma analysis [Particle-PLUS] Specializes in plasma analysis for semiconductor-related devices at low pressure. - 3D rarefied gas analysis [DSMC-Neutrals] Supports calculations of complex shapes and analyzes gas flow simulations throughout the entire device. ■ Integrated simulation for materials development [Materials Studio] Supports various fields such as crystal growth, catalysts, fuel cells, lubricants, catalysts, and polymers. ■ Dedicated thermal fluid analysis for pumps and valves [PumpLinx] Analyzes the transient characteristics of fluids in various volumetric pumps, compressors, and valves. ■ General-purpose thermal fluid analysis software [Simerics MP for SOLIDWORKS] CAD-integrated thermal fluid analysis that can be operated on SOLIDWORKS. *Please feel free to contact us for more details!
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Magnetron Sputtering Analysis Software 'Particle-PLUS'

"Particle-PLUS" is a plasma and rarefied fluid analysis software that specializes in magnetron sputtering devices using the particle method.

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It excels in low-pressure plasma analysis. - It can perform advanced physical model analyses such as CCP and external circuit models. - It specializes in plasma simulations in low-pressure gases, where fluid modeling is challenging. - It supports 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing efficient analysis of complex models. - As a strength of our in-house developed software, it can perform standard CCP and magnetron sputtering calculations, as well as customization to fit customer devices. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

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Plasma simulation software "Particle-PLUS"

"Particle-PLUS" is a plasma and rarefied fluid analysis software that uses the particle method.

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - It can perform advanced physical model analysis such as CCP and external circuit models. - It excels in plasma simulation for low-pressure gases, where calculations using fluid models are challenging. - It supports 2D (two-dimensional) and 3D (three-dimensional) analysis, efficiently handling complex models. - As a strength of our in-house developed software, it can perform standard CCP and magnetron sputtering calculations, as well as customization to fit the customer's equipment. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

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Particle-based Plasma Analysis Software 'Particle-PLUS'

"Particle-PLUS" is a plasma analysis software suitable for simulations such as plasma reaction furnaces and chemical vapor deposition (CVD).

Particle-PLUS is plasma and rarefied fluid analysis software that uses the particle method. It is effective for research, development, and manufacturing of devices and materials using plasma. It is also capable of analyzing advanced physical models such as dual-frequency CCP and external circuit models. With comprehensive support, even those new to simulation or busy with experiments can reliably achieve results. The software employs a particle model to analyze plasma, utilizing the PIC/MC (Particle In Cell / Monte Carlo) method to track the motion of particles representing electrons and ions. Depending on the target plasma density, it efficiently switches between implicit methods for relatively high densities and explicit methods for low densities, allowing for effective solutions even for complex models. It excels in plasma simulations of low-pressure gases, where fluid modeling is particularly challenging. In addition to standard functions for CCP, ICP, and magnetron sputtering calculations, customization to fit customer devices is also available.

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Analysis software for CVD equipment 'Particle-PLUS'

"Particle-PLUS" is a plasma and rarefied fluid analysis software that excels in 2-frequency CCP analysis using the particle method.

"Particle-PLUS" is a simulation software suitable for research and development of devices and equipment using plasma, compatible with CCP. - Excels in simulating low-pressure gases where fluid models are difficult to compute. - Advanced physical model analysis including CCP and external circuit models. - Supports 2D (two-dimensional) and 3D (three-dimensional) analysis, efficiently handling complex models. - As a strength of our in-house developed software, it not only includes standard functions for CCP and magnetron sputtering calculations but also allows customization to fit customer equipment. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD), etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us at information@wavefront.co.jp.

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1)2周波CCP(外部回路有り) 解析_電子密度.jpg

CCP simulation analysis software "Particle-PLUS"

"Particle-PLUS" is a plasma and rarefied fluid analysis software that is also skilled in 2-frequency CCP analysis using the particle method.

"Particle-PLUS" is a simulation software suitable for research and development of devices using plasma, compatible with CCP. - Excels in plasma simulation for low-pressure gases, where fluid modeling is challenging. - Advanced physical model analysis, including CCP and external circuit models. - Supports 2D and 3D, efficiently analyzing even complex models. - As a strength of our in-house developed software, it offers standard functions for CCP and magnetron sputtering calculations, as well as customization to fit customer devices. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitive Coupled Plasma (CCP) - Dielectric Barrier Discharge (DBD), etc. ◆ Outputs various calculation results ◆ - Potential distribution - Electron and ion density distribution/temperature distribution/generation distribution - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Neutral gas density distribution/temperature distribution/velocity distribution, etc. *For more details, please feel free to contact us at information@wavefront.co.jp.

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Analysis software for showerhead-type CVD, "DSMC-Neutrals"

Dilute fluid analysis software 'DSMC-Neutrals' that also supports 'shower head type CVD' analysis.

Simulation analysis of gas flow in a shower head type CVD device Initially supports various simulations 【Features】 ■ Adopts unstructured mesh, allowing for calculations that reflect the complex shapes of actual devices ■ High parallel efficiency enables quick computation results even for large-scale geometries ■ Utilizes a particle method, ensuring convergence to a solution even with poor-quality computational grids, unlike fluid models ■ Comprehensive technical support allows beginners and those busy with experiments to reliably achieve results ◆ Supports various cases ◆ - Simulation of dilute gas flow in a vacuum chamber - Simulation of thin film generation in semiconductor manufacturing - Simulation of thin film generation in semiconductor manufacturing such as chemical vapor deposition (CVD), organic light-emitting diode (OLED), and molecular beam epitaxy (MBE) ◆ Outputs various computational results ◆ - Calculation of chemical reactions - Calculation of chemical reactions from Arrhenius-type reaction data - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions - Multiple reaction equations can be set up on the GUI *We also offer contract analysis, so please feel free to contact us.*

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Thin Fluid Analysis Software for Vacuum Devices 'DSMC-Neutrals'

Analysis of gas flow under low-pressure conditions can be performed. Analysis software that also supports rarefied gases (rarefied fluids).

**Features** - Adopts unstructured mesh, allowing for calculations that directly reflect the complex shapes of actual devices. - High parallel efficiency enables quick computation results even for large-scale shapes. - Utilizes a particle method, ensuring convergence solutions even with poor-quality computational grids, unlike fluid models. - Comprehensive technical support ensures that even those new to simulations or busy with experiments can reliably achieve results. **Supports Various Cases** - Simulation of rarefied gas flow within a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Simulation of thin film generation in semiconductor manufacturing processes such as Chemical Vapor Deposition (CVD), Organic Light Emitting Diodes (OLED), and Molecular Beam Epitaxy (MBE). **Outputs Various Calculation Results** - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions. - Ability to set multiple reaction equations on the GUI. *For more details, please refer to the catalog or feel free to contact us.*

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Dust behavior analysis software 'DSMC-Neutrals'

"Dust behavior affecting contamination" analysis supported by the rarefied fluid analysis software 'DSMC-Neutrals'.

Simulation Analysis of Dust Behavior Affecting Contamination Initially compatible with various simulations 【Features】 ■ By adopting unstructured meshes, it is possible to compute the exact shape of complex actual devices. ■ High parallel efficiency allows for quick computation results even for large-scale shapes. ■ Since a particle method is used, unlike fluid models, convergence solutions can always be obtained even with poor quality computational grids. ■ With comprehensive technical support, even those new to simulations or busy with experiments can reliably achieve results. ◆ Compatible with various cases ◆ - Simulation of rarefied gas flow in a vacuum chamber - Simulation of thin film generation in semiconductor manufacturing - Simulation of thin film generation in semiconductor manufacturing such as Chemical Vapor Deposition (CVD), Organic EL (OLED), and Molecular Beam Epitaxy (MBE) ◆ Outputs various computation results ◆ - Calculation of chemical reactions - Calculation of chemical reactions from Arrhenius-type reaction data - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions - Multiple reaction equations can be set up on the GUI *We also offer contract analysis, so please feel free to contact us.

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3D rarefied fluid analysis software "DSMC-Neutrals"

Analysis of gas flow under low-pressure conditions. Analysis software compatible with rarefied gases (rarefied fluids).

**Features** - By adopting an unstructured mesh, it is possible to compute the exact shape of complex real devices. - High parallel efficiency allows for quick computation results even for large-scale shapes. - Since it employs a particle method, unlike fluid models, it can achieve a converged solution even with poor-quality computational grids. - With comprehensive technical support, even those new to simulation or busy with experiments can reliably obtain results. **Supports Various Cases** - Simulation of rarefied gas flow in a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Chemical vapor deposition (CVD), organic light-emitting diode (OLED), molecular beam epitaxy (MBE). - Film deposition simulations that include chemical reactions like CVD. **Outputs Various Calculation Results** - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculations of dissociation, recombination, and molecular (atomic) exchange reactions. - Multiple reaction equations can be set up on the GUI. *For more details, please refer to the catalog or feel free to contact us.*

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Easy fluid analysis with CAD: "Simerics MP for SW"

Advanced analysis can be easily performed on SOLIDWORKS! For shortening development time and reducing costs!

"Simerics MP for SOLIDWORKS" is a CAD-integrated thermal fluid analysis software that can be operated within SOLIDWORKS. Integrated into the SOLIDWORKS GUI, designers can perform everything from design to analysis themselves. The calculation settings are also simple, allowing for quick mastery of the operation. By enabling designers to conduct various analyses, such as examining optimal shapes, identifying the causes of problems, and verifying performance—tasks that were traditionally outsourced—this leads to reduced development time, improved quality, and cost savings. 【Features】 ■ Supports a wide range of simulations including flow, turbulence, heat conduction, and convection ■ Automatically generates computational meshes directly from CAD surfaces ■ Extremely fast, accurate, and robust solver ■ Stable iterative calculations for very challenging problems, such as micro-meter scale geometries ■ Accurate calculation results that show excellent correlation with physical tests *For more details, please refer to the materials. Feel free to contact us with any inquiries.

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Easy CFD on CAD: 'Simerics MP for SW'

Advanced analysis can be easily performed on SOLIDWORKS! For shortening development time and reducing costs!

"Simerics MP for SOLIDWORKS" is a CAD-integrated thermal fluid analysis software that can be operated on SOLIDWORKS. Integrated into the SOLIDWORKS GUI, designers can perform everything from design to analysis themselves. The calculation settings are simple, allowing for quick mastery of the operation. By enabling designers to conduct various analyses that were traditionally outsourced, such as optimal shape evaluation, root cause investigation, and performance verification, it leads to reduced development time, improved quality, and cost savings. 【Features】 ■ Supports a wide range of simulations including flow, turbulence, heat conduction, and convection ■ Automatically generates computational meshes directly from CAD surfaces ■ Extremely fast, accurate, and robust solver ■ Stable iterative calculations for very challenging problems, such as micro-meter scale geometries ■ Accurate calculation results that show excellent correlation with physical tests *For more details, please refer to the materials. Feel free to contact us with any inquiries.

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『Simerics MP for SOLIDWORKS』

Advanced analysis can be easily performed on SOLIDWORKS! For shortening development time and reducing costs.

"Simerics MP for SOLIDWORKS" is a CAD-integrated thermal fluid analysis software that can be operated within SOLIDWORKS. Integrated into the SOLIDWORKS GUI, designers can perform everything from design to analysis themselves. The calculation settings are also simple, allowing for quick mastery of the operation. By enabling designers to conduct various analyses that were traditionally outsourced, such as optimal shape exploration, problem identification, and performance verification, it leads to reduced development time, improved quality, and cost savings. 【Features】 ■ Supports a wide range of simulations including flow, turbulence, heat conduction, and convection ■ Automatically generates calculation meshes directly from CAD surfaces ■ Extremely fast, accurate, and robust solver ■ Stable iterative calculations for very challenging problems such as micro-scale geometries ■ Accurate calculation results that show excellent correlation with physical tests *For more details, please refer to the materials. Feel free to contact us with any inquiries.

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CCS3 product photo

The new product "Vehicle Count Sensor CCS3" enables efficient occupancy management of large parking lots.

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Hotron Inc. has launched its new product, the "Vehicle Count Sensor CCS3"! This product is a ceiling-mounted sensor that combines infrared and radar technology. It reliably detects vehicles in both directions with a single unit, accommodating traffic during congestion and vehicle passing, thus achieving efficient occupancy management in large parking lots. Additionally, it can be utilized for exit warning purposes in addition to vehicle counting, contributing to the safe and smooth operation of parking facilities. 'Features' - Improved detection performance against changes in road surface during rainy weather by using both infrared and radar. - Equipped with IP67 waterproof and dustproof performance, making it effective even in salt damage areas. - Various settings can be configured from a dedicated app (for Android devices), with current settings easily visible at a glance. - The base dimensions are the same as the previous model "CCS2," allowing for smooth replacement of existing equipment. *For more details, please refer to the product information, catalog download, or contact us.*

Sep 11, 2026

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KSI EXPO 2026 Measurement and 3D Measurement Spatial Digital Comprehensive Exhibition September 16, 2026 (Wednesday) 10:00 AM to 5:00 PM

KSI EXPO 2026 Measurement and 3D Measurement Spatial Digital Comprehensive Exhibition September 16, 2026 (Wednesday) 10:00 AM - 5:00 PM Osaka City Central Public Hall (1-1-27 Nakanoshima, Kita-ku, Osaka)

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From measurement instruments to point cloud processing and analysis software, the latest solutions come together! We propose numerous cutting-edge technologies and products that solve on-site challenges in a one-stop manner. It's not just about seeing; it's about experiencing, consulting, and bringing it back to the field. At the venue, we will showcase the latest measurement instruments and solutions, including 3D laser scanners, handheld 3D scanners, LiDAR drones, and 3DGS (Gaussian Splatting). Additionally, we will announce surprise new products!

Sep 09, 2026

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We have published an article comparing and ranking six system construction manufacturers for 2026 on the Select Beam special site.

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We have updated the article on the website of the semi-custom system construction "Select Beam." When planning factories, logistics warehouses, and stores, "system construction" has become an effective means of achieving cost reduction and shortening construction periods. The rationality of system construction through thorough standardization is very high, and it is adopted in many projects. However, due to the differing characteristics of each manufacturer, many business owners find themselves wondering, "Which manufacturer is suitable for our plans?" and "Is it really optimal compared to conventional methods?" In this article, we will compare and introduce the basic knowledge of the advantages and disadvantages of system construction, as well as recommend manufacturers by purpose in a ranking format. ■ Semi-Custom System Construction "Select Beam" This is a unique method by Sakura Structure, and it is a "third option" that is less expensive than system construction. It is the most suitable method for low-rise long-span buildings such as stores, warehouses, factories, and logistics facilities, as well as high-rise buildings like hotels.

Sep 09, 2026

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Comparison of Floor Slab Types and Selection Criteria: Cost Optimization for the Right Material in the Right Place

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"Because the ground is poor, we have no choice but to use a structural slab." Such fixed notions of "over-design" unnecessarily drive up construction costs. In large space buildings such as warehouses, factories, and stores, the choice of floor slab type is one of the most significant variables affecting construction costs. What is important is to compare and verify the advantages and risks of each type, and to derive the optimal solution that is "suitable for the purpose" for the entire building. By reading this content, you will understand the following points: - Characteristics of the five main construction methods with different support forms - Recommended situations for adoption - Cost comparison examples of floor slabs "I am struggling with the dilemma of floor settlement risks and costs on weak ground." "I want to know the optimal solution for the site without being tied to a specific construction method." Construction companies and general contractor representatives facing such issues are encouraged to take a look.

Sep 09, 2026

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October 23-24: Announcement of Participation in the Hokuriku Technology Exchange Techno Fair 2026

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Our company will be exhibiting at the "Hokuriku Technology Exchange Techno Fair 2026." Dates: October 23rd, 10:00 AM - 5:00 PM October 24th, 10:00 AM - 4:00 PM Venue: Fukui Prefectural Industrial Hall We look forward to your visit.

Sep 08, 2026

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