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  6. Particle-based Plasma Analysis Software 'Particle-PLUS'

Particle-based Plasma Analysis Software 'Particle-PLUS'

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Particle-PLUS

last updated:Apr 06, 2023

ウェーブフロント 本社
ウェーブフロント 本社
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"Particle-PLUS" is a plasma analysis software suitable for simulations such as plasma reaction furnaces and chemical vapor deposition (CVD).

Particle-PLUS is plasma and rarefied fluid analysis software that uses the particle method. It is effective for research, development, and manufacturing of devices and materials using plasma. It is also capable of analyzing advanced physical models such as dual-frequency CCP and external circuit models. With comprehensive support, even those new to simulation or busy with experiments can reliably achieve results. The software employs a particle model to analyze plasma, utilizing the PIC/MC (Particle In Cell / Monte Carlo) method to track the motion of particles representing electrons and ions. Depending on the target plasma density, it efficiently switches between implicit methods for relatively high densities and explicit methods for low densities, allowing for effective solutions even for complex models. It excels in plasma simulations of low-pressure gases, where fluid modeling is particularly challenging. In addition to standard functions for CCP, ICP, and magnetron sputtering calculations, customization to fit customer devices is also available.

    Other analytical equipmentScientific Calculation and Simulation SoftwareOther Software
dual_frequency_ccp_model.png

Particle-based Plasma Analysis Software 'Particle-PLUS'

dual_frequency_ccp_model.png
dual_frequency_ccp_model.png
  • Related Link - http://www.wavefront.co.jp/CAE/particle-plus/

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basic information

**Features** - The time scheme uses an implicit method, allowing for stable time evolution to be obtained over a large computation time width Δt compared to conventional methods. - The collision reaction model between neutral gas and electrons and ions employs the Monte Carlo Scattering method, enabling accurate and rapid calculations of complex reaction processes. - The neutral gas module determines the initial neutral gas distribution used in the above plasma module, allowing for the evaluation of gas flow in a short time using the DSMC method. - The sputtered particle module calculates the behavior of atoms sputtered from the target in plasma and neutral gas environments, such as the flux distribution on opposing substrates, which can be evaluated in a short time. - For other functions and details, please refer to the catalog.

Price range

P5

Delivery Time

P3

Applications/Examples of results

【Dual Frequency Capacitive Coupled Plasma】 - Optimization of voltage and other parameters to achieve high-density plasma - Damage to chamber walls - Optimization of power using external circuit models - It is possible to apply voltages to the electrode plates that align with real devices - The waveform of the applied voltage can be simulated smoothly and with relatively realistic voltages - Calculations are relatively stable to avoid applying excessive voltages 【DC Magnetron Sputtering】 - Uniformity of erosion dependent on magnetic field distribution - Adsorption distribution of sputtered materials on the substrate 【Pulsed Voltage Magnetron Sputtering】 - Optimization of the application time of pulsed voltage to efficiently sputter materials 【Ion Implantation】 - Influence of the substrate on the erosion distribution 【Time Evolution of Applied Voltage on Electrode Plates】 - Enables observation of physical quantities that are difficult to measure experimentally, such as electron density and ion velocity distribution - By investigating electron density and ion velocity distribution, it is possible to examine the uniformity of the film and damage to the chamber walls - Changing calculation conditions allows for optimization of high-density plasma generation at low power

catalog(14)

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Particle-based Plasma Analysis Software 'Particle-PLUS'

Particle-based Plasma Analysis Software 'Particle-PLUS'

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Analysis software specialized for semiconductor-related equipment.

Analysis software specialized for semiconductor-related equipment.

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Sputtering Equipment Analysis Software 'Particle-PLUS'

Sputtering Equipment Analysis Software 'Particle-PLUS'

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Semiconductor Device Analysis Software 'Particle-PLUS'

Semiconductor Device Analysis Software 'Particle-PLUS'

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CVD device analysis software "Particle-PLUS"

CVD device analysis software "Particle-PLUS"

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Particle-based Plasma Analysis Software 'Particle-PLUS'

Particle-based Plasma Analysis Software 'Particle-PLUS'

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Handling CAE solutions

Handling CAE solutions

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[Case Study] CCP Plasma Simulation Using the Particle-PLUS External Circuit Model

[Case Study] CCP Plasma Simulation Using the Particle-PLUS External Circuit Model

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[Case Study] Particle-PLUS Cylindrical Magnetron Device Plasma Sputtering Simulation

[Case Study] Particle-PLUS Cylindrical Magnetron Device Plasma Sputtering Simulation

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[Case Study] Particle-PLUS DC Magnetron Sputtering Simulation

[Case Study] Particle-PLUS DC Magnetron Sputtering Simulation

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[Case Study] Particle-PLUS DC Magnetron Sputtering (3D Calculation) Simulation

[Case Study] Particle-PLUS DC Magnetron Sputtering (3D Calculation) Simulation

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[Case Study] Particle-PLUS Counter-Target Sputtering Simulation

[Case Study] Particle-PLUS Counter-Target Sputtering Simulation

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[Case Study] Particle-PLUS Opposing Target Sputtering Simulation

[Case Study] Particle-PLUS Opposing Target Sputtering Simulation

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[Case Study] Particle-PLUS RF Magnetron Sputtering Simulation

[Case Study] Particle-PLUS RF Magnetron Sputtering Simulation

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News about this product(10)

July 3 (Wed) - July 5 (Fri) 【Exhibition Participation】Announcement of ISSP2024 Corporate Exhibition Corner Participation

  • Seminar・Event

The International Symposium on Sputtering and Plasma Processes 2024 (ISSP2024) will be held from July 3 (Wednesday) to July 5 (Friday), 2024, organized by the Surface Vacuum Society. Our company will be exhibiting at the corporate exhibition corner. ■ Exhibition Homepage https://www.issp-jvss.org/ ISSP is an international exhibition specialized in sputtering and plasma process technology. This will be the first event in five years since ISSP2019 was held in 2019. Please be sure to stop by our exhibition corner. We will also be holding consultation sessions with our technical staff and demonstrating our developed software, including Particle-PLUS and DSMC-Neutrals!! We sincerely look forward to your visit.

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Handling CAE Solutions

  • Other・notification

A rich lineup of "CAE solutions" available in various fields ■ Plasma Solutions - Low Temperature Plasma Analysis [VizGlow] Analyzes plasma under various conditions using a compressible fluid model. - Thermal Plasma Analysis [VizSpark] Analyzes heat and temperature rise associated with heat generated by arc plasma. - Particle Method Plasma Analysis [Particle-PLUS] Specializes in plasma analysis for semiconductor-related devices at low pressure. - 3D Rarefied Gas Analysis [DSMC-Neutrals] Supports calculations of complex shapes and analyzes gas flow simulations throughout the entire device. ■ Integrated Simulation for Material Development [Materials Studio] Supports various fields such as crystal growth, catalysts, fuel cells, lubricants, catalysts, and polymers. ■ Dedicated Thermal Fluid Analysis for Pumps and Valves [PumpLinx] Analyzes the transient characteristics of fluids in various volumetric pumps, compressors, and valves. ■ General Purpose Thermal Fluid Analysis Software [Simerics MP for SOLIDWORKS] CAD-integrated thermal fluid analysis that can be operated on SOLIDWORKS. *Please feel free to contact us for more details!

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Handling CAE Solutions

  • Catalog news

A rich lineup of "CAE solutions" available in various fields ■ Plasma Solutions - Low-Temperature Plasma Analysis [VizGlow] Analyzes plasma under various conditions using a compressible fluid model. - Thermal Plasma Analysis [VizSpark] Analyzes heat generated by arc plasma and the resulting temperature rise. - Particle Method Plasma Analysis [Particle-PLUS] Specializes in plasma analysis for semiconductor-related devices at low pressure. - 3D Rarefied Gas Analysis [DSMC-Neutrals] Supports calculations for complex shapes and analyzes gas flow throughout the entire device. ■ Integrated Simulation for Material Development [Materials Studio] Supports various fields such as crystal growth, catalysts, fuel cells, lubricants, catalysts, and polymers. ■ Dedicated Thermal Fluid Analysis for Pumps and Valves [PumpLinx] Analyzes the transient characteristics of fluids in various volumetric pumps, compressors, and valves. ■ General-Purpose Thermal Fluid Analysis Software [Simerics MP for SOLIDWORKS] CAD-integrated thermal fluid analysis that can be operated on SOLIDWORKS. *Please feel free to contact us for more details!

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Handling CAE Solutions

  • Product news

A rich lineup of "CAE solutions" available in various fields ■ Plasma Solutions - Low-temperature plasma analysis [VizGlow] Analyzes plasma under various conditions using a compressible fluid model. - Thermal plasma analysis [VizSpark] Analyzes heat generated by arc plasma and the resulting temperature rise. - Particle method plasma analysis [Particle-PLUS] Specializes in plasma analysis for semiconductor-related devices at low pressure. - 3D rarefied gas analysis [DSMC-Neutrals] Supports calculations of complex shapes and analyzes gas flow simulations throughout the entire device. ■ Integrated simulation for materials development [Materials Studio] Supports various fields such as crystal growth, catalysts, fuel cells, lubricants, catalysts, and polymers. ■ Dedicated thermal fluid analysis for pumps and valves [PumpLinx] Analyzes the transient characteristics of fluids in various volumetric pumps, compressors, and valves. ■ General-purpose thermal fluid analysis software [Simerics MP for SOLIDWORKS] CAD-integrated thermal fluid analysis that can be operated on SOLIDWORKS. *Please feel free to contact us for more details!

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Our company develops and sells a "Maintenance Management System" for managing and operating various plants, factories, and other facilities and assets. Currently, this system is undergoing significant evolution into a system that incorporates IoT technologies, such as sensor information and input from tablet devices, as well as AI technologies like machine learning, featuring functions for failure prediction and automatic scheduling. Additionally, as part of the recent trend of digital transformation (DX), there is a growing movement to digitize and automate manufacturing processes and research and development sites in factories to improve operational efficiency. In line with this trend, our company provides a solution aimed at enhancing efficiency in research and development environments, which is the Laboratory Information Management System (LIMS). This software includes features such as workflow management, data tracking, data management, data analysis, and integration of electronic lab notebooks.

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