Handling CAE Solutions

"Particle-PLUS" is a plasma and rarefied fluid analysis software that specializes in magnetron sputtering devices using the particle method.

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It excels in low-pressure plasma analysis. - It can perform advanced physical model analyses such as CCP and external circuit models. - It specializes in plasma simulations in low-pressure gases, where fluid modeling is challenging. - It supports 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing efficient analysis of complex models. - As a strength of our in-house developed software, it can perform standard CCP and magnetron sputtering calculations, as well as customization to fit customer devices. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

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• Scientific Calculation and Simulation Software
• Other Software

"Particle-PLUS" is a plasma and rarefied fluid analysis software that uses the particle method.

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - It can perform advanced physical model analysis such as CCP and external circuit models. - It excels in plasma simulation for low-pressure gases, where calculations using fluid models are challenging. - It supports 2D (two-dimensional) and 3D (three-dimensional) analysis, efficiently handling complex models. - As a strength of our in-house developed software, it can perform standard CCP and magnetron sputtering calculations, as well as customization to fit the customer's equipment. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

• Other analytical equipment
• Scientific Calculation and Simulation Software
• Other Software

"Particle-PLUS" is a plasma analysis software suitable for simulations such as plasma reaction furnaces and chemical vapor deposition (CVD).

Particle-PLUS is plasma and rarefied fluid analysis software that uses the particle method. It is effective for research, development, and manufacturing of devices and materials using plasma. It is also capable of analyzing advanced physical models such as dual-frequency CCP and external circuit models. With comprehensive support, even those new to simulation or busy with experiments can reliably achieve results. The software employs a particle model to analyze plasma, utilizing the PIC/MC (Particle In Cell / Monte Carlo) method to track the motion of particles representing electrons and ions. Depending on the target plasma density, it efficiently switches between implicit methods for relatively high densities and explicit methods for low densities, allowing for effective solutions even for complex models. It excels in plasma simulations of low-pressure gases, where fluid modeling is particularly challenging. In addition to standard functions for CCP, ICP, and magnetron sputtering calculations, customization to fit customer devices is also available.

• Other analytical equipment
• Scientific Calculation and Simulation Software
• Other Software

"Particle-PLUS" is a plasma and rarefied fluid analysis software that excels in 2-frequency CCP analysis using the particle method.

"Particle-PLUS" is a simulation software suitable for research and development of devices and equipment using plasma, compatible with CCP. - Excels in simulating low-pressure gases where fluid models are difficult to compute. - Advanced physical model analysis including CCP and external circuit models. - Supports 2D (two-dimensional) and 3D (three-dimensional) analysis, efficiently handling complex models. - As a strength of our in-house developed software, it not only includes standard functions for CCP and magnetron sputtering calculations but also allows customization to fit customer equipment. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD), etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us at information@wavefront.co.jp.

• Other analytical equipment
• Scientific Calculation and Simulation Software
• Other Software

"Particle-PLUS" is a plasma and rarefied fluid analysis software that is also skilled in 2-frequency CCP analysis using the particle method.

"Particle-PLUS" is a simulation software suitable for research and development of devices using plasma, compatible with CCP. - Excels in plasma simulation for low-pressure gases, where fluid modeling is challenging. - Advanced physical model analysis, including CCP and external circuit models. - Supports 2D and 3D, efficiently analyzing even complex models. - As a strength of our in-house developed software, it offers standard functions for CCP and magnetron sputtering calculations, as well as customization to fit customer devices. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitive Coupled Plasma (CCP) - Dielectric Barrier Discharge (DBD), etc. ◆ Outputs various calculation results ◆ - Potential distribution - Electron and ion density distribution/temperature distribution/generation distribution - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Neutral gas density distribution/temperature distribution/velocity distribution, etc. *For more details, please feel free to contact us at information@wavefront.co.jp.

• Other analytical equipment
• Scientific Calculation and Simulation Software
• Other Software

Dilute fluid analysis software 'DSMC-Neutrals' that also supports 'shower head type CVD' analysis.

Simulation analysis of gas flow in a shower head type CVD device Initially supports various simulations 【Features】 ■ Adopts unstructured mesh, allowing for calculations that reflect the complex shapes of actual devices ■ High parallel efficiency enables quick computation results even for large-scale geometries ■ Utilizes a particle method, ensuring convergence to a solution even with poor-quality computational grids, unlike fluid models ■ Comprehensive technical support allows beginners and those busy with experiments to reliably achieve results ◆ Supports various cases ◆ - Simulation of dilute gas flow in a vacuum chamber - Simulation of thin film generation in semiconductor manufacturing - Simulation of thin film generation in semiconductor manufacturing such as chemical vapor deposition (CVD), organic light-emitting diode (OLED), and molecular beam epitaxy (MBE) ◆ Outputs various computational results ◆ - Calculation of chemical reactions - Calculation of chemical reactions from Arrhenius-type reaction data - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions - Multiple reaction equations can be set up on the GUI *We also offer contract analysis, so please feel free to contact us.*

• Scientific Calculation and Simulation Software

Analysis of gas flow under low-pressure conditions can be performed. Analysis software that also supports rarefied gases (rarefied fluids).

**Features** - Adopts unstructured mesh, allowing for calculations that directly reflect the complex shapes of actual devices. - High parallel efficiency enables quick computation results even for large-scale shapes. - Utilizes a particle method, ensuring convergence solutions even with poor-quality computational grids, unlike fluid models. - Comprehensive technical support ensures that even those new to simulations or busy with experiments can reliably achieve results. **Supports Various Cases** - Simulation of rarefied gas flow within a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Simulation of thin film generation in semiconductor manufacturing processes such as Chemical Vapor Deposition (CVD), Organic Light Emitting Diodes (OLED), and Molecular Beam Epitaxy (MBE). **Outputs Various Calculation Results** - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions. - Ability to set multiple reaction equations on the GUI. *For more details, please refer to the catalog or feel free to contact us.*

• Analysis and prediction system
• Scientific Calculation and Simulation Software

"Dust behavior affecting contamination" analysis supported by the rarefied fluid analysis software 'DSMC-Neutrals'.

Simulation Analysis of Dust Behavior Affecting Contamination Initially compatible with various simulations 【Features】 ■ By adopting unstructured meshes, it is possible to compute the exact shape of complex actual devices. ■ High parallel efficiency allows for quick computation results even for large-scale shapes. ■ Since a particle method is used, unlike fluid models, convergence solutions can always be obtained even with poor quality computational grids. ■ With comprehensive technical support, even those new to simulations or busy with experiments can reliably achieve results. ◆ Compatible with various cases ◆ - Simulation of rarefied gas flow in a vacuum chamber - Simulation of thin film generation in semiconductor manufacturing - Simulation of thin film generation in semiconductor manufacturing such as Chemical Vapor Deposition (CVD), Organic EL (OLED), and Molecular Beam Epitaxy (MBE) ◆ Outputs various computation results ◆ - Calculation of chemical reactions - Calculation of chemical reactions from Arrhenius-type reaction data - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions - Multiple reaction equations can be set up on the GUI *We also offer contract analysis, so please feel free to contact us.

• Scientific Calculation and Simulation Software
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• Other Hydrogen/Fuel Cells

Analysis of gas flow under low-pressure conditions. Analysis software compatible with rarefied gases (rarefied fluids).

**Features** - By adopting an unstructured mesh, it is possible to compute the exact shape of complex real devices. - High parallel efficiency allows for quick computation results even for large-scale shapes. - Since it employs a particle method, unlike fluid models, it can achieve a converged solution even with poor-quality computational grids. - With comprehensive technical support, even those new to simulation or busy with experiments can reliably obtain results. **Supports Various Cases** - Simulation of rarefied gas flow in a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Chemical vapor deposition (CVD), organic light-emitting diode (OLED), molecular beam epitaxy (MBE). - Film deposition simulations that include chemical reactions like CVD. **Outputs Various Calculation Results** - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculations of dissociation, recombination, and molecular (atomic) exchange reactions. - Multiple reaction equations can be set up on the GUI. *For more details, please refer to the catalog or feel free to contact us.*

• Analysis and prediction system
• Scientific Calculation and Simulation Software

Advanced analysis can be easily performed on SOLIDWORKS! For shortening development time and reducing costs!

"Simerics MP for SOLIDWORKS" is a CAD-integrated thermal fluid analysis software that can be operated within SOLIDWORKS. Integrated into the SOLIDWORKS GUI, designers can perform everything from design to analysis themselves. The calculation settings are also simple, allowing for quick mastery of the operation. By enabling designers to conduct various analyses, such as examining optimal shapes, identifying the causes of problems, and verifying performance—tasks that were traditionally outsourced—this leads to reduced development time, improved quality, and cost savings. 【Features】 ■ Supports a wide range of simulations including flow, turbulence, heat conduction, and convection ■ Automatically generates computational meshes directly from CAD surfaces ■ Extremely fast, accurate, and robust solver ■ Stable iterative calculations for very challenging problems, such as micro-meter scale geometries ■ Accurate calculation results that show excellent correlation with physical tests *For more details, please refer to the materials. Feel free to contact us with any inquiries.

• Other CAD
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Advanced analysis can be easily performed on SOLIDWORKS! For shortening development time and reducing costs!

"Simerics MP for SOLIDWORKS" is a CAD-integrated thermal fluid analysis software that can be operated on SOLIDWORKS. Integrated into the SOLIDWORKS GUI, designers can perform everything from design to analysis themselves. The calculation settings are simple, allowing for quick mastery of the operation. By enabling designers to conduct various analyses that were traditionally outsourced, such as optimal shape evaluation, root cause investigation, and performance verification, it leads to reduced development time, improved quality, and cost savings. 【Features】 ■ Supports a wide range of simulations including flow, turbulence, heat conduction, and convection ■ Automatically generates computational meshes directly from CAD surfaces ■ Extremely fast, accurate, and robust solver ■ Stable iterative calculations for very challenging problems, such as micro-meter scale geometries ■ Accurate calculation results that show excellent correlation with physical tests *For more details, please refer to the materials. Feel free to contact us with any inquiries.

• Other CAD
• Scientific Calculation and Simulation Software
• Other Software

Advanced analysis can be easily performed on SOLIDWORKS! For shortening development time and reducing costs.

"Simerics MP for SOLIDWORKS" is a CAD-integrated thermal fluid analysis software that can be operated within SOLIDWORKS. Integrated into the SOLIDWORKS GUI, designers can perform everything from design to analysis themselves. The calculation settings are also simple, allowing for quick mastery of the operation. By enabling designers to conduct various analyses that were traditionally outsourced, such as optimal shape exploration, problem identification, and performance verification, it leads to reduced development time, improved quality, and cost savings. 【Features】 ■ Supports a wide range of simulations including flow, turbulence, heat conduction, and convection ■ Automatically generates calculation meshes directly from CAD surfaces ■ Extremely fast, accurate, and robust solver ■ Stable iterative calculations for very challenging problems such as micro-scale geometries ■ Accurate calculation results that show excellent correlation with physical tests *For more details, please refer to the materials. Feel free to contact us with any inquiries.

• Other CAD
• Scientific Calculation and Simulation Software
• Other Software

Are you making progress on measures for the "2024 Problem"? The management of drivers' working hours is becoming stricter, and in the logistics field, reducing "waiting time for loading" has become an urgent issue. To address this challenge, our company, Hotron, proposes the "Vehicle Detection Ultrasonic Sensor 'HM-UX2'," which instantly grasps the availability of loading bays. The 'HM-UX2' contributes to the resolution of waiting times by accurately understanding the availability status, reducing unnecessary waiting and queuing, and shortening waiting times, thereby alleviating the burden on drivers! By replacing the "eyes" of your loading bay management with this high-precision sensor, why not start taking measures against the "2024 Problem"? Take a look at the product features: "Can it accurately detect availability?" "Can we really use it in our company?" "I just want to know the cost, even if it's an estimate." If you have any questions or requests, please feel free to consult us first.

We sincerely apologize for the inconvenience, but we will be closed for summer vacation during the following period. Closure period: August 9 (Saturday) to August 17 (Sunday), 2025 Inquiries received during this period will be addressed sequentially starting from August 18 (Monday). We appreciate your understanding and cooperation.

Thank you very much for visiting our booth at the "High-Performance Materials Week [Osaka] 13th High-Performance Plastics Exhibition." Thanks to you, we had many visitors and were able to conclude the event successfully. In addition to the "PPLB-445" displayed on the day, we have a variety of products available. For those who were unable to measure samples at the venue, we offer a trial measurement service. Furthermore, for those who would like to know more about our products and services, we also accept online meetings. We welcome inquiries from those who attended as well as those who could not make it this time due to scheduling conflicts. Please feel free to contact us.

Aioi System is pleased to announce the release of the low-power wireless display "NW2991-JP," which achieves long battery life. This product supports 920MHz band wireless communication and can be operated in conjunction with wired displays. It can be easily integrated into existing systems by simply adding a master unit. With a high-speed response time of under one second and a variety of display functions for text and barcodes, it supports a wide range of applications. ▼ For more details, please see the press release linked below ▼ ■ Main Features - Maintenance-free design with a battery life of one year (low power consumption) - Compatible with mixed operation with wired displays - High-speed response (under one second) and diverse display formats - Stable communication in the 920MHz band ■ You can see the actual product at the exhibition This product will be displayed at the TOPPAN booth during the International Logistics Comprehensive Exhibition 2025, 4th INNOVATION EXPO. We invite you to visit the venue, see the actual product, and experience its performance. Dates: September 10 (Wed) - 12 (Fri), 2025 Venue: Tokyo Big Sight (Halls 4-8) Booth No: 5-907 (TOPPAN booth) Exhibition official website ▶ linked below We sincerely look forward to your visit.

Thank you very much for visiting our booth at the "Monozukuri World (Measurement, Inspection, and Sensor Exhibition) 2025." Thanks to you, we had many visitors, and the event concluded successfully. In addition to the "PPLB-445" showcased on the day, we have a variety of products available. For those who were unable to conduct sample measurements at the venue, we offer a trial measurement service. Furthermore, for those who would like to learn more about our products and services, we also accept online meetings. We welcome inquiries from those who attended, as well as those who were unable to come this time due to scheduling conflicts. Please feel free to reach out to us.