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By forming a thin film on the surface of metals and polymer materials, it is possible to control the mechanical, thermal, chemical, and electrical properties of the material's surface. Various methods are employed for the thin film deposition used in this surface modification, including vacuum deposition, PVD, and plasma CVD methods. It is expected that the exploration and development of new deposition methods will continue in the future. In this document, we present the results of our examination of the potential for a thin film manufacturing process using a "high-output xenon excimer lamp." [Contents] ■ Introduction ■ Film deposition rate using light CVD method with "high-output xenon excimer lamp" ■ Conclusion *For more details, please refer to the PDF document or feel free to contact us.

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A method for obtaining silica films through relatively low-temperature heat treatment has been reported, which involves firing ceramic precursor polymers such as perhydropolysilazane in the atmosphere or in water vapor at a temperature of around 450°C. This study aimed to utilize the strong oxidative action of active oxygen species to convert PHPS, which does not contain oxygen unlike TMOS and TEOS, into silica at low temperatures. To investigate the effects of oxygen concentration in the irradiation atmosphere during thin film formation and the necessity of bond cleavage due to photon energy, we examined the film quality when VUV light was irradiated on spin-coated films using PHPS solution under varying irradiation conditions. [Contents] ■ Introduction ■ Experiment ■ Results and Discussion ■ Conclusion *For more details, please refer to the PDF document or feel free to contact us.

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In the late 1980s, a powerful vacuum ultraviolet light source known as the xenon excimer lamp, which utilizes dielectric barrier discharge, was developed. The light obtained from this source at a wavelength of 172 nm has a high energy of 7.2 eV, enabling efficient photodissociation of various molecular bonds. As a result, the lamp has been put to practical use in applications such as the precision optical cleaning of glass substrates used in liquid crystal display panels, among various other applications. In this study, we examined the physical and chemical changes on the surface of polyethylene, a general-purpose resin with low printability and adhesion, when irradiated with vacuum ultraviolet light. [Contents] ■ Introduction ■ Experiment ■ Results and Discussion ■ Conclusion *For more details, please refer to the PDF document or feel free to contact us.

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This document introduces the current status of "vacuum ultraviolet excimer lamps" and their industrial applications. Excimer refers to a dimer formed by one atom or molecule in an excited state and one atom or molecule in the ground state. The "vacuum ultraviolet excimer lamp" has features such as the ability to emit quasi-monochromatic light and short-wavelength light not found in general lamps, as well as the capability for instant lighting and flashing. Additionally, because vacuum ultraviolet light has a short wavelength and high photon energy, it can break molecular bonds through non-thermal processes. [Contents] ■ What is a vacuum ultraviolet excimer lamp? ■ Applications of vacuum ultraviolet excimer lamps *For more details, please refer to the PDF document or feel free to contact us.

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Polymers are lightweight and flexible, making them suitable for various applications. Recently, a surface modification technique using vacuum ultraviolet (VUV) light has gained attention. VUV light has a short wavelength and high photon energy, allowing it to break molecular bonds through non-thermal processes. Compared to typical physical surface treatments such as plasma treatment, it is low-cost and causes minimal damage to the surface while enabling surface modification. In this study, we investigated the physical and chemical changes on the surface caused by VUV light irradiation on polymers, as well as the differences in modification effects due to the ambient gas during irradiation. [Contents] ■ Introduction ■ Experiment ■ Results and Discussion *For more details, please refer to the PDF document or feel free to contact us.

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To obtain a strong and dense film on plastics with low heat resistance, it is necessary to lower the temperature in the thin film formation process. The photon process using vacuum ultraviolet (VUV) light has an energy per photon that is greater than the bond energy of atoms in most materials. Furthermore, since it can cleave atomic bonds solely through the action of photons without accompanying thermal processes from irradiation, it is expected to contribute to the reduction of temperature in the thin film formation process. In this study, we compared and examined the decomposition process and changes in crystal structure of TiO2, which is widely used in industry, when gel films were thermally treated and when VUV light irradiation from an excimer lamp was combined with thermal treatment. [Contents] ■ Introduction ■ Experimental Methods ■ Results and Discussion *For more details, please refer to the PDF document or feel free to contact us.

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Around the end of the 1980s, high-brightness vacuum ultraviolet lamps utilizing excimer emission were developed. For example, excimer lamps using xenon gas can produce vacuum ultraviolet light at a wavelength of 172 nm with a high light intensity of 100 W/m², and they are actively applied in processes such as photodecomposition cleaning and photomodification of material surfaces. In this presentation, we examined the necessary technological elements for achieving a light intensity of 1-2 kW/m², which is 10 to 20 times brighter than conventional lamps. [Contents] - Principles of excimer lamps and research and development objectives - Discharge methods - Lamp shapes *For more details, please refer to the PDF document or feel free to contact us.

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The sol-gel method, which is a promising approach to obtain coatings with uniform composition, typically requires heat treatment at several hundred degrees Celsius to remove moisture from the gel film and decompose organic components. This makes it difficult to obtain a strong film on low-temperature-resistant plastics. Therefore, the vacuum ultraviolet (VUV) light-based photon process can be considered applicable for modifying thin films, as it can break atomic bonds solely through the action of photons without accompanying thermal processes from irradiation. This document introduces the changes in state when VUV light is irradiated onto nickel oxide thin films adjusted by the sol-gel method, using an excimer lamp developed as a practical light source. [Contents] ■ Introduction ■ Experiment ■ Results and Discussion *For more details, please refer to the PDF document or feel free to contact us.

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Vacuum ultraviolet (VUV) light, due to its short wavelength and high photon energy, can break molecular bonds through non-thermal processes, leading to advancements in applications such as cleaning, microfabrication, and surface modification. In this document, after spin-coating a PVA aqueous solution onto a gold-coated substrate, a heating treatment was performed to create a film, which was then irradiated with a xenon excimer lamp (172 nm) under a nitrogen or dry air atmosphere. Using an infrared spectrometer and X-ray photoelectron spectroscopy, we observed changes in the chemical state of the PVA film due to VUV irradiation. [Features] ■ Introduction ■ Experiment ■ Results and Discussion *For more details, please refer to the PDF document or feel free to contact us.

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The photochemical surface treatment method for materials using vacuum ultraviolet excimer lamps has characteristics such as "low cost" and "ease of large area processing." As a result, it can be applied to various industrial fields, including photonic cleaning, photonic thin film formation, photonic modification, and photochemical modification. This document presents the results of an investigation into the effects of photochemical surface treatment using atomic force microscopy (AFM). [Contents] ■ Introduction ■ Experiment ■ Results *For more details, please refer to the PDF document or feel free to contact us.

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The "eVIO" is a UV light that has achieved the use in human environments, which was previously impossible with conventional UV wavelengths, through a new technology that maintains the original virus suppression and sterilization capabilities of ultraviolet light while minimizing effects on humans and animals. It does not use an external filter and can emit a wavelength of 222nm ultraviolet light on its own. Additionally, it is effective for sterilizing surfaces, and especially in unoccupied environments, continuous exposure is possible, maximizing the sterilization effect. 【Features】 ■ Excellent effectiveness for space sterilization ■ Effective for sterilizing surfaces ■ Established safety for use in human environments ■ 222nm ultraviolet light ■ Does not use external filters, which were common in conventional products *For more details, please refer to the PDF materials or feel free to contact us.

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Quark Technology Co., Ltd. manufactures and sells various industrial equipment utilizing cutting-edge optical application technologies. Through the development of vacuum ultraviolet and UV-LED light sources, we have introduced manufacturing technologies for semiconductor production, as well as new displays such as LCDs, PDPs, films, and EL, along with various electronic materials and devices. Additionally, we are planning research and development to address the demand for waste and environmental management equipment, which are pressing medical and social issues. All matter is composed of atoms, nucleons, and "quarks." At Quark Technology, we continue to research light and challenge ourselves in industrial application technologies. 【Business Activities】 ○ Manufacturing and sales of ultraviolet irradiation devices ○ Manufacturing and sales of UV-LED irradiation devices ○ Manufacturing and sales of semiconductor manufacturing equipment ○ Handling of various quartz and ceramic products For more details, please contact us or download our catalog.

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