Contributing to the low-temperature process of thin film formation! A comparative study on the decomposition process and changes in crystal structure.
To obtain a strong and dense film on plastics with low heat resistance, it is necessary to lower the temperature in the thin film formation process. The photon process using vacuum ultraviolet (VUV) light has an energy per photon that is greater than the bond energy of atoms in most materials. Furthermore, since it can cleave atomic bonds solely through the action of photons without accompanying thermal processes from irradiation, it is expected to contribute to the reduction of temperature in the thin film formation process. In this study, we compared and examined the decomposition process and changes in crystal structure of TiO2, which is widely used in industry, when gel films were thermally treated and when VUV light irradiation from an excimer lamp was combined with thermal treatment. [Contents] ■ Introduction ■ Experimental Methods ■ Results and Discussion *For more details, please refer to the PDF document or feel free to contact us.
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Quark Technology Co., Ltd. manufactures and sells various industrial equipment utilizing cutting-edge optical application technology. Through the development of vacuum ultraviolet and UV-LED light sources, we have introduced manufacturing technologies for semiconductor production, as well as new displays such as LCDs, PDPs, films, and EL, along with various electronic materials and devices. Additionally, we are planning research and development to address the demand for waste and environmental management equipment, which are pressing medical and social issues. All substances are composed of atoms, nucleons, and "quarks." At Quark Technology, we continue to research light and challenge ourselves in industrial application technologies.
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