Utilizing high-output xenon excimer lamps! An introduction to the film deposition rate of the light CVD method.
By forming a thin film on the surface of metals and polymer materials, it is possible to control the mechanical, thermal, chemical, and electrical properties of the material's surface. Various methods are employed for the thin film deposition used in this surface modification, including vacuum deposition, PVD, and plasma CVD methods. It is expected that the exploration and development of new deposition methods will continue in the future. In this document, we present the results of our examination of the potential for a thin film manufacturing process using a "high-output xenon excimer lamp." [Contents] ■ Introduction ■ Film deposition rate using light CVD method with "high-output xenon excimer lamp" ■ Conclusion *For more details, please refer to the PDF document or feel free to contact us.
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Quark Technology Co., Ltd. manufactures and sells various industrial equipment utilizing cutting-edge optical application technology. Through the development of vacuum ultraviolet and UV-LED light sources, we have introduced manufacturing technologies for semiconductor production, as well as new displays such as LCDs, PDPs, films, and EL, along with various electronic materials and devices. Additionally, we are planning research and development to address the demand for waste and environmental management equipment, which are pressing medical and social issues. All substances are composed of atoms, nucleons, and "quarks." At Quark Technology, we continue to research light and challenge ourselves in industrial application technologies.
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