[Case Study] RTP (Rapid Thermal Process)
This is a case study of RTP using light sources for light heating from Ushio, a company with tradition and a wealth of achievements. In the past, semiconductor thermal processing commonly used furnaces (insulated), but for nano-order devices, thin film formation and shallow junctions are required, making RTP, synonymous with isothermal processes, a key technology. Additionally, in next-generation semiconductors, flash lamp annealing has become the mainstream technology as a thermal flux technique. ● For other functions and details, please contact us.
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This is a case study of RTP using light sources for light heating from Ushio, a company with a tradition and a wealth of achievements. In the past, semiconductor thermal processing commonly used furnaces (insulated), but for nano-order devices, thin film formation and shallow junctions are required, making RTP, which is synonymous with isothermal processes, a key technology. Additionally, in next-generation semiconductors, flash lamp annealing has become the mainstream thermal flux technology. ● For other functions and details, please contact us.
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Heating, hardening, cleaning, modification, surface treatment, adhesion, exposure, lighting, treatment, measurement, and testing... When it comes to "light," leave it to Ushio. From light sources to units and light devices, we propose the optimal "light" tailored to our customers' objectives and applications using our unique light technology (we also offer joint experiments, joint research, and lending of demo and experimental equipment).
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