What can be done with Ushio's light: "Impurity Diffusion"
This is an introduction to practical examples of Ushio's light sources for light heating, which have a rich and comprehensive track record (impurity diffusion). 【Features】 ○ Light sources used: Xenon flash lamp, halogen heater lamp ○ In the semiconductor process, implantation is performed on the source drain, followed by an annealing process to activate the doped impurities. ○ Utilizing the characteristics of the xenon flash lamp, it is possible to perform high-temperature annealing in a very short time frame (on the order of milliseconds) to extremely shallow depths (on the order of nm) compared to the previous active layer depth, thereby preventing impurity diffusion. ● For other functions and details, please contact us.
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This is an introduction to practical examples of Ushio's light sources for optical heating, which have a rich and comprehensive track record (impurity diffusion). 【Features】 ○ Light sources used: Xenon flash lamp, halogen heater lamp ○ In the semiconductor process, implants are performed on the source drain, and then the doped impurities are activated through the annealing process. ○ Utilizing the characteristics of the xenon flash lamp, it is possible to perform high-temperature annealing in a very short time frame (on the order of milliseconds) to extremely shallow depths (on the order of nm) compared to the previous active layer depth, thereby preventing impurity diffusion. ● For other functions and details, please contact us.
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【Purpose】 ○ Activation of impurities injected into silicon wafers
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Heating, hardening, cleaning, modification, surface treatment, adhesion, exposure, lighting, treatment, measurement, and testing... When it comes to "light," leave it to Ushio. From light sources to units and light devices, we propose the optimal "light" tailored to our customers' objectives and applications using our unique light technology (we also offer joint experiments, joint research, and lending of demo and experimental equipment).
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