Comparison of cross-sectional observation images

We will introduce suitable observation methods for cross-sectional observation of chip resistors and copper wiring sections!

To assist you in selecting an observation device, we will introduce the differences in visibility between metal microscopes, W-SEM, and FE-SEM. When observing the cross-section of chip resistors, there are areas that are difficult to observe at low magnification with a metal microscope, but with SEM observation, the depth of focus is greater, allowing for high-flatness images even at low magnification. When observing the cross-section of copper wiring, the copper-resin interface and the condition inside cracks can be observed with W-SEM, but with FE-SEM, it is possible to clearly observe even the crystal grains and tiny voids at the connection interface. [Comparison] ■ Cross-section observation of chip resistors: Comparison of images between metal microscope and W-SEM ■ Cross-section observation of copper wiring: Comparison of images between W-SEM and FE-SEM *For more details, please download the PDF or feel free to contact us.

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