Supports everything from UVLED to advanced power devices, with simple processes for nitride film crystal growth using PVD.
A crystalline nitride film formation device using PVD (sputtering) that contributes to the mass production of ultraviolet LEDs. Crystalline thin films comparable to the CVD method are formed by PVD (sputtering). Simple, safe, and easy to handle. Promotes the latest nitride semiconductor processes through simpler device management and operation. Robust and advanced process performance that supports a wide range of applications from R&D to full-scale mass production. The latest crystalline film deposition device that updates the trends in nitride semiconductors.
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basic information
The basic standard type is a load lock device compatible with 8-inch wafers. It can be customized based on production volume and processes, and it supports up to cluster-type multi-chamber configurations.
Price information
Negotiable
Delivery Time
※Negotiable
Applications/Examples of results
Template for UV LED Template for power devices and nitride/compound semiconductors Substrate/template for high-frequency devices
Company information
Shinko Seiki, as a technology-driven manufacturer, leverages the numerous know-how accumulated particularly in the field of vacuum equipment to deliver innovative products that meet user needs. In recent years, the company has also been challenging cutting-edge fields such as electronics and new materials, aiming to develop truly valuable hardware and software through the advancement of distinctive technologies and their organic integration.
