others

神港精機 東京支店

EstablishmentJanuary 24, 1949
capital37500Ten thousand
number of employees194
addressTokyo/Chuo-ku/2nd Floor, Kusunoki Nihonbashi Building, 4-2-16 Nihonbashi Muromachi
phone03-3271-2156
last updated：
神港精機logo

神港精機 List of Products and Services

1～1 item / All 1 items

Displayed results

Crystal film deposition device for template manufacturing

Supports everything from UVLED to advanced power devices, with simple processes for nitride film crystal growth using PVD.

A crystalline nitride film formation device using PVD (sputtering) that contributes to the mass production of ultraviolet LEDs. Crystalline thin films comparable to the CVD method are formed by PVD (sputtering). Simple, safe, and easy to handle. Promotes the latest nitride semiconductor processes through simpler device management and operation. Robust and advanced process performance that supports a wide range of applications from R&D to full-scale mass production. The latest crystalline film deposition device that updates the trends in nitride semiconductors.

  • Other Smart Grid

Added to bookmarks

Bookmarks list

Bookmark has been removed

Bookmarks list

You can't add any more bookmarks

By registering as a member, you can increase the number of bookmarks you can save and organize them with labels.

Free membership registration