Analysis of dual magnetron sputtering considering the accurate shape is possible.
The particle method plasma analysis software 'Particle-PLUS', developed by Wavefront Inc., can analyze simultaneous magnetron sputtering in devices where the substrate and target are not in equilibrium. With the cut cell creation function, it allows for high-precision electric field calculations characteristic of orthogonal grids while considering accurate shapes and normal directions. *For more details, please download the PDF or feel free to contact us.*
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【Specifications】 ■Product Name: Particle-PLUS ■Price Range: Please contact us ■Delivery Time: Please contact us *For more details, please download the PDF or feel free to contact us.
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Applications/Examples of results
【Calculable Cases】 ■ Magnetron Sputtering ■ PVD, Plasma CVD ■ Capacitive Coupled Plasma (CCP) ■ Electrophoresis, etc. 【Features】 ■ Specializes in low-pressure plasma analysis ■ Combines axisymmetric models with mirror-symmetric boundary conditions to quickly obtain results without simulating the entire device ■ Excels in plasma simulation for low-pressure gases, which are difficult to compute with fluid models ■ Supports both 2D and 3D, allowing efficient analysis even for complex models ■ As a strength of our in-house developed software, customization to fit customer devices is also possible *For more details, please download the PDF or feel free to contact us.
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Download All Catalogs![[Case Study] Plasma Analysis of Particle-PLUS Simultaneous Sputtering Device](https://image.www.ipros.com/public/catalog/image/01/922/774675/IPROS62395394559876083227.jpeg?w=120&h=170)
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Our company develops and sells a "Maintenance Management System" for managing and operating various plants, factories, and other facilities and assets. Currently, this system is undergoing significant evolution into a system that incorporates IoT technologies, such as sensor information and input from tablet devices, as well as AI technologies like machine learning, featuring functions for failure prediction and automatic scheduling. Additionally, as part of the recent trend of digital transformation (DX), there is a growing movement to digitize and automate manufacturing processes and research and development sites in factories to improve operational efficiency. In line with this trend, our company provides a solution aimed at enhancing efficiency in research and development environments, which is the Laboratory Information Management System (LIMS). This software includes features such as workflow management, data tracking, data management, data analysis, and integration of electronic lab notebooks.
![[Analysis User Case] Hitachi Construction Machinery Co., Ltd.](https://image.www.ipros.com/public/product/image/d9e/2000414536/IPROS565590723641951325.png?w=280&h=280)
