A single system can monitor up to three types of gases (NH3, HF, HCl)!
"SAM-S" is an AMC monitoring device that integrates a cavity ring-down spectroscopy (CRDS) analysis system with a high-performance sampling system. It enables high gas flow rates, minimizes cross-port contamination, and quickly reports accurate AMC concentrations. Additionally, it can be configured to sample from up to 16 different locations and, when combined with Picarro's SI3401 gas analyzer, can measure ammonia (NH3), hydrogen fluoride (HF), and hydrogen chloride (HCl). 【Features】 ■ Inline AMC monitoring system ■ Measurement of NH3, HF, and HCl at ppt levels ■ Response time in seconds ■ Minimal setup time ■ Monitoring multiple locations within a cleanroom *For more details, please refer to the PDF document or feel free to contact us.
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【Other Features】 ■ Equipped with an industrial computer with a built-in keyboard ■ Secure software and communication ■ Programmed cleaning cycles ■ Regular port purging to minimize cross-port contamination *For more details, please refer to the PDF document or feel free to contact us.
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We handle various inspection and analysis equipment, including new and used devices. (Fully automatic XPS film thickness concentration measurement device, overlay accuracy measurement device, double-sided coordinate measurement device, film thickness measurement device, ellipsometer, optical three-dimensional measurement device, wafer edge inspection device, transparent wafer front and back defect inspection device, appearance inspection device, optical microscope, exposure device)