If you do not remove the dirt from the grinding pad, it will lead to scratches!
When polishing with polyurethane pads using cerium oxide and other materials, abrasives inevitably remain in gaps and holes. The efficiency of the next polishing operation greatly depends on how well the abrasives are removed during the cleaning at the end of the workday. However, doing this manually can lead to uneven cleaning, and if this accumulates, it poses a risk of shortening the lifespan of the polishing pads. Therefore, we recommend using a brush carrier. Please feel free to contact us to see if it can be adapted to your work environment for improved quality. 【Benefits of the Brush Carrier】 ■ Other tasks can be performed while cleaning the brush ■ Reduced likelihood of rate decrease due to pad clogging ■ Polishing quality has stabilized, leading to improved yield *For more details, please feel free to contact us.
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【Instructions】 ■1. Install a brush carrier suitable for the equipment ■2. Set the time, pressure, etc., and perform brush cleaning ■3. Rinse off any remaining dirt after the brush cleaning is complete *For more details, please feel free to contact us.
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Since its establishment in 1937 (Showa 12), Yachiyo Micro Science has been a specialized trading company for grinding and polishing materials, while also continuously engaging in product development related to grinding and polishing through its research and development department. We also operate the technical information sites "Grinding and Polishing .COM" and "Aglutinants .COM." Please take a look.