A heating device capable of large-area simultaneous irradiation and high-intensity irradiation! It can also perform multiple pulse irradiations.
The "Flash Lamp Annealing Device" is a light-based heating device that instantaneously anneals objects within one second. Utilizing the light from a xenon flash lamp with a continuous wavelength range from UV to visible and infrared, it allows for variable settings within the range of 0.1 to 60 milliseconds. It can be used for various applications utilizing a wide spectrum, such as sintering, peeling, and surface modification. 【Features】 ■ Spectrum - Wide wavelength characteristics from ultraviolet to visible and infrared regions ■ High output and large area processing (shortened tact time, high uniformity) - Multiple flash lamps can be arranged according to the work size, enabling large area irradiation and high intensity (Max 70J/cm²) irradiation. *For more details, please refer to the PDF document or feel free to contact us.
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【Other Features】 ■Depth Control (Pulse Control) - By controlling the current flowing to the lamp with a semiconductor switch to turn it ON/OFF, it is possible to adjust the lamp current and pulse width, thereby controlling the heating depth (0.1 to 60 msec). - Multiple pulse irradiation is also possible. *For more details, please refer to the PDF document or feel free to contact us.
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【Applications】 ■ Sintering ■ Stripping ■ Surface modification ■ Oxide film formation ■ Crystallization ■ Adhesion *For more details, please refer to the PDF document or feel free to contact us.
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Heating, hardening, cleaning, modification, surface treatment, adhesion, exposure, lighting, treatment, measurement, and testing... When it comes to "light," leave it to Ushio. From light sources to units and light devices, we propose the optimal "light" tailored to our customers' objectives and applications using our unique light technology (we also offer joint experiments, joint research, and lending of demo and experimental equipment).
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