[Case Study] Particle-PLUS: RF Magnetron for Dielectric Targets

basic information

**Features** - The time scheme uses an implicit method, allowing for stable time evolution to be calculated over a large time step Δt compared to conventional methods. - The collision reaction model between neutral gas and electrons and ions employs the Monte Carlo Scattering method, enabling accurate and rapid calculations of complex reaction processes. - The neutral gas module determines the initial neutral gas distribution used in the above plasma module, allowing for quick evaluation of gas flow using the DSMC method. - The sputtered particle module calculates the behavior of atoms sputtered from the target in devices such as magnetron sputtering systems, enabling rapid evaluation of flux distribution on opposing substrates. *For other functions and details, please feel free to contact us.*

Price range

Delivery Time

P4

Applications/Examples of results

【Dual Frequency Capacitive Coupled Plasma】 - Optimization of voltage and other parameters to achieve high-density plasma - Damage to the chamber walls - Optimization of power using an external circuit model - It is possible to apply voltages to the electrode plates that align with real devices - The waveform of the applied voltage can be simulated smoothly and with relatively realistic voltages - Calculations are relatively stable to avoid applying unreasonable voltages 【DC Magnetron Sputtering】 - Uniformity of erosion dependent on magnetic field distribution - Adsorption distribution of sputtered materials on the substrate 【Pulsed Voltage Magnetron Sputtering】 - Optimization of the application time of pulsed voltage to efficiently sputter materials 【Ion Implantation】 - The influence of the substrate on the erosion distribution 【Temporal Changes of Applied Voltage on Electrode Plates】 - It is possible to observe physical quantities that are difficult to measure experimentally, such as electron density and ion velocity distribution - By investigating electron density and ion velocity distribution, it is possible to examine the uniformity of the film and damage to the chamber walls - By changing calculation conditions, optimization of high-density plasma generation at low power is possible

Detailed information

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  Introduction to Particle-PLUS Analysis Examples RF Magnetron Sputtering of Dielectric Targets

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  ◇Model Overview Analysis case of RF magnetron sputtering of dielectric targets in an axisymmetric model.

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  Neutral gas pressure and static magnetic field - Ar pressure - Magnetic flux density

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  Electric potential and electron number density - Electric potential (periodic average) - Electron number density (periodic average)

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  Ion energy - Ar+ ion energy - Ar+ ion incident energy flux

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  Sputtering and film formation - Number density (color display) and flow rate (arrow display) - Deposition rate on the substrate surface - Erosion rate on the target surface