Generate machine learning data from CAE analysis models! Software that allows easy execution of calculation results in plasma analysis.
"Particle-PLUS/DL" is a CAE surrogate model software that addresses the challenges of traditional plasma simulations. It combines deep learning, which is gaining attention as the "fourth science," with CAE. It enables parametric studies through high-speed calculations, making it useful in the initial examination of plasma analysis. Additionally, it generates training data for machine learning from CAE analysis models, allowing for analysis even without a large amount of experimental data. 【Features】 ■ Results can be confirmed in a few seconds ■ Simple and easy-to-understand GUI ■ Plasma analysis is possible even without a large amount of experimental values ■ Does not diverge ■ Compatible with Windows 10 machines *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Recommended for】 ■ Manufacturers of semiconductor-related equipment ■ Those interested in plasma analysis ■ Those interested in CAE surrogate model software *For more details, please refer to the PDF document or feel free to contact us.
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Applications/Examples of results
【Usage】 ■ You can immediately view the results of the initial phase of plasma analysis. ■ Analysis can be conducted without specialized knowledge in simulation analysis. *For more details, please refer to the PDF document or feel free to contact us.
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![[Data] Plasma Analysis Surrogate Model Software Using Deep Learning 'Particle-PLUS/DL'](https://image.www.ipros.com/public/catalog/image/01/424/592302/IPROS33441351480957202662.jpeg?w=120&h=170)
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Our company develops and sells a "Maintenance Management System" for managing and operating various plants, factories, and other facilities and assets. Currently, this system is undergoing significant evolution into a system that incorporates IoT technologies, such as sensor information and input from tablet devices, as well as AI technologies like machine learning, featuring functions for failure prediction and automatic scheduling. Additionally, as part of the recent trend of digital transformation (DX), there is a growing movement to digitize and automate manufacturing processes and research and development sites in factories to improve operational efficiency. In line with this trend, our company provides a solution aimed at enhancing efficiency in research and development environments, which is the Laboratory Information Management System (LIMS). This software includes features such as workflow management, data tracking, data management, data analysis, and integration of electronic lab notebooks.
![[Case Study] Plasma Analysis of "Particle-PLUS" Dual Frequency CCP](https://image.www.ipros.com/public/product/image/aec/2000679537/IPROS56625809199193232139.jpeg?w=280&h=280)
![[Example] "Particle-PLUS" Counter Target Sputtering](https://image.www.ipros.com/public/product/image/19d/2000545489/IPROS56615479397902732461.png?w=280&h=280)
![[Example] Particle-PLUS Opposing Target Sputter](https://image.www.ipros.com/public/product/image/e9b/2000513668/IPROS23162634189120626847.png?w=280&h=280)
![[Example] 'Particle-PLUS' DC Magnetron Sputter](https://image.www.ipros.com/public/product/image/fc0/2000505508/IPROS46756835108606467165.png?w=280&h=280)
