Compatible with quartz glass up to a maximum size of W1500×H1200×t10mm.
This device is a two-tank (release agent application and rinse) release agent application system. It has a circulation function for each tank and can apply release agents to large-sized quartz glass up to 45 kg per sheet. It accommodates samples measuring W1500×H1200mm and up to t10. This device enables uniform application of release agents to large substrates and structures, featuring a robust design and high-precision control.
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basic information
This device is a two-tank (release agent application and rinse) release agent application machine. Each tank has a circulation function and can apply release agents to large-sized quartz glass up to 45 kg per sheet. Stroke: 1300 mm Target size: W: 1500 × H: 1200 mm, t10 Target materials: Glass, ceramics, resins, etc. Dip speed: 0.1 mm/sec to 60 mm/sec Circulation part for application liquid: Yes Temperature control for application liquid: No Filter mesh: No Drying section: No Drying temperature: No HEPA unit: No Device size (approximate dimensions): W: 2200 × D: 2000 × H: 3253 mm
Price range
P7
Delivery Time
※The usual delivery time is 2.5 months after the order is received.
Applications/Examples of results
This device is a two-tank (release agent application and rinse) release agent application system. Each tank has a circulation function and can apply release agents to large quartz glass sheets weighing up to 45 kg per sheet. It has been introduced for research and development of large substrates for displays and building materials, and has a proven track record in factory prototype lines.
Line up（18）
| Model number | overview |
|---|---|
| NIC-1106 | A desktop model that achieves high-precision and stable release agent application for small substrates. |
| NIC-1103 | 6 to 8 inch board compatible, versatile medium-sized nano coater. |
| NIC-0809 | Nano coater optimized for φ200mm substrates, suitable for a wide range of research and development. |
| NIC-1109G | BOX-integrated design that achieves high-precision coating in an inert gas environment. |
| NIC-1208 | High-power model compatible with 600mm square substrates, achieving uniform coating of large samples. |
| NIC-1410-S1 | High-precision dip coater for small cubic samples, compatible with thicknesses up to 1.5mm. |
| NIC-1308 | Dedicated nano coater compatible with roll materials, capable of continuous coating. |
| DT-1104 | A dedicated device for achieving uniform coating on disk media. |
| MD-1501-S1 | Dip coating device with a circulation mechanism that enhances liquid stability and has high chemical resistance. |
| SA-1109 | High-precision cleaning of substrates and samples is possible with ultrasonic cleaning. |
| SA-1202 | An efficient cleaning and drying integrated device that combines warm water drying. |
| NIC-1510 | A high-performance model that balances tank replacement and cleaning, accommodating multiple uses. |
| MD-1802 | High-efficiency model enabling multilayer film formation and continuous processing with an 8-slot configuration. |
| LD-1811 | Linear type that achieves oxidation prevention and stable film formation through nitrogen purge. |
| NIC-2003 | Supports a maximum stroke of 1.3m, an ideal model for handling large circuit boards. |
| DT-1812 | Ideal for continuous process treatment, flexible support for various prototypes with an 8-tank system. |
| DT-2002 | Specialized dip coater for cylindrical materials, compatible with diameters of φ20 to 60mm. |
| NIC-2409 | Nano coater for large cylindrical materials compatible with Φ200〜700mm sleeves. |
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