Solving the challenges of the past! We have significantly improved the film formation speed while maintaining low damage characteristics.
In conventional planar sputtering, significant damage is inflicted on the substrate, and in opposing sputtering, the film formation speed is slow, posing practical challenges. Our "RAM Cathode" has succeeded in generating dense plasma near the target surface by surrounding the target on all sides. By having argon ions strike the target with great force and vigor, we have resolved the issues that existed previously. 【Features】 ■ Reduces damage to the substrate by over 60% compared to conventional planar cathodes ■ Achieves film formation speeds more than three times faster than conventional opposing cathodes *For more details, please refer to the PDF document or feel free to contact us.
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Keihin Ramtech was founded in 1972 and has become a trusted manufacturer in the LCD and semiconductor manufacturing equipment industry as well as the automotive industry. At our company, we believe that continuous technological development is the responsibility of all employees. The unique technologies possessed by Keihin Ramtech are utilized as core technologies across various industries. As a proposer that continues to develop and propose innovative technologies expected to further advance in the future, we will contribute to our customers' further development.