[Analysis Case] Magnetron Sputtering Simulation

basic information

Particle-PLUS consists of several key modules. ■ Plasma Module It analyzes the behavior of electrons and ions using the Particle In Cell method (PIC). The solver features an implicit time scheme, allowing for stable time evolution over a large computation time width Δt compared to conventional methods. Additionally, it employs the Monte-Carlo Scattering method for collision reaction models between neutral gas and electrons and ions, enabling accurate and rapid calculations of complex reaction processes, which are crucial in process plasma simulations. ■ Neutral Gas Module This module determines the initial neutral gas distribution used in the plasma module, allowing for the evaluation of gas flow in a short time using the DSMC method. ■ Sputtered Particle Module This module calculates the behavior of atoms sputtered from a target in devices such as magnetron sputtering systems, enabling quick evaluation of flux distributions on opposing substrates. Furthermore, Particle-PLUS supports parallel computing, allowing for rapid results.

Price range

P5

Delivery Time

Applications/Examples of results

【Dual Frequency Capacitive Coupled Plasma】 - Optimization of voltage and other parameters to achieve high-density plasma - Damage to chamber walls - Optimization of power using external circuit models - It is possible to apply voltages to the electrode plates that align with real devices - The waveform of the applied voltage can be smooth and relatively realistic for simulation - Calculations are relatively stable to avoid applying unreasonable voltages 【DC Magnetron Sputtering】 - Uniformity of erosion dependent on magnetic field distribution - Adsorption distribution of sputtered materials on the substrate 【Pulsed Voltage Magnetron Sputtering】 - Optimization of the application time of pulsed voltage to efficiently sputter materials 【Ion Implantation】 - The influence of the substrate on the erosion distribution 【Time Evolution of Applied Voltage on Electrode Plates】 - It is possible to observe physical quantities that are difficult to measure experimentally, such as electron density and ion velocity distribution - By investigating electron density and ion velocity distribution, it is possible to examine the uniformity of the film and damage to the chamber walls - Changing calculation conditions allows for the optimization of high-density plasma generation at low power