Capable of dual-side alignment, proximity, and soft contact exposure.
It is a mask aligner that aligns a glass mask with a workpiece in photolithography processes such as wafers and glass substrates, and transfers a fine mask pattern onto the photoresist coated on the substrate.
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basic information
This is a mask aligner that aligns a glass mask with a workpiece in photolithography processes such as wafers and glass substrates, transferring fine mask patterns onto the photoresist coated on the plate. It supports both front and back alignment, as well as proximity and soft contact exposure. *For more details, please download the catalog and contact us.*
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Applications/Examples of results
Semiconductor field
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Company information
For over half a century, we have continuously refined our technological and product capabilities. By integrating Ushio's unique proposal power with these strengths, we provide solutions that pave the way for the next generation to society and the market. In the business domain of light and industry, where further evolution is anticipated, we will maximize all our capabilities to contribute to the development of our customers and society.