■□■ Small Vertical Furnace for R&D TVF-110 ■□■

Low-cost essential minimum configuration (manual control) tubular furnace, diffusion furnace, and thermal CVD applicable
Vertical experimental furnace with manual lift for small substrates ranging from small samples to 3-inch wafers
Ideal low-cost vertical furnace for basic experiments in university and corporate research labs
【Applications】
◉ Thermal processing for semiconductors, solar cells, fuel cells, electronic substrates, etc.
◉ Basic experiments: simple thermal processing experiments using vertical tubular furnaces, oxidation diffusion furnaces, LPCVD, etc.
【Main Specifications】
- Maximum furnace temperature: 1200℃, maximum sample temperature: 950℃
- Small sample size: accommodates sizes from a few millimeters to 3-inch wafers
- Number of substrates: approximately 1 to 3 sheets
- Quartz susceptor with manual lift: includes stop position scale and clamp
- Furnace core tube: Φ100 x Φ95 x 470L mm
- Lifting: manual rotating handle
- Temperature control: PID programmable temperature controller
- Thermocouples: 2 pairs of K-type thermocouples x1 (for control and over-temperature), K-type bare wire (for furnace core temperature measurement)

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Vertical experimental furnace with manual lift for small substrates, suitable for samples up to 3-inch wafers. An ideal low-cost version for basic experiments in university and corporate research laboratories.