☆★☆ Spatter and Vapor Deposition Source Composite Film Formation Device 【nanoPVD-ST15A】 ☆★☆

Sputter Cathode and Co-evaporation Source Mixed Thin Film Experimental Device. Metal deposition, organic deposition, and sputter cathode are installed in a compact frame.
A resistance heating deposition source (metal deposition), an organic deposition source (organic materials), and magnetron sputtering (metal and insulating materials) are installed within the chamber, allowing for various thin film experimental setups with a single chamber.
◉ Three combinations available:
1. Sputter Cathode + Resistance Heating Deposition Source x2
2. Sputter Cathode + Organic Deposition Source x2
3. Sputter Cathode + Resistance Heating Source x1 + Organic Deposition Source x1 (*DC sputtering only)
【Specifications】
◉ Compatible substrates: up to Φ4 inch
◉ Sputtering: 2" cathode x up to 3 sources
◉ Vacuum deposition: Resistance heating deposition (up to 2), organic deposition (up to 4)
◉ 7" touch panel operation with PLC automatic process control
◉ APC automatic pressure control
◉ 1 line of Ar gas (standard) + N2, O2 can be added
◉ Connect to a Windows PC with USB port for recipe creation and storage. Data logging on PC
◉ Various other options available
◉ Easy operation with 7" touch panel and PLC automatic process control


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