◇◆◇ nanoPVD-S10A Magnetron Sputtering Device ◇◆◇

This is an RF/DC magnetron sputtering device for research and development. Despite its high performance and multifunctionality, it fits into limited laboratory space with a compact size and easy operation via a 7-inch front touch panel.
● Achievable pressure: 5x10^-5 Pa (*fastest 30 minutes to 1x10^-4 Pa!)
● Film uniformity: ±3%
● Various options: up/down rotation, heater, cathode for magnetic materials, and more
● 3-source cathode + 3 MFC systems, with additional RF/DC power supply, can be utilized for multilayer films and simultaneous deposition among other purposes.
- Insulating films
- Conductive films
- Compounds, etc.
【Main Features】
◉ Compatible substrates: 2" (up to 3 sources) or 1" (1 source)
◉ 2" cathode x up to 3 sources
◉ Easy operation via touch panel with PLC automatic program control
◉ MFC high-precision APC automatic process pressure control
◉ Up to 3 MFC systems
◉ USB port for Windows PC connection, capable of creating and saving recipes for up to 1000 layers and 50 films. Live data logging on PC.
◉ Vacuum system: TMP + RP (*dry pump option)
◉ Substrate rotation, up/down elevation, heating (Max 500℃)
◉ Quartz crystal film thickness monitor/controller


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Compact, small footprint high-performance RF/DC magnetron sputtering system