Plasma Analysis Software - List of Manufacturers, Suppliers, Companies and Products

Plasma Analysis Software Product List

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[Example] "Particle-PLUS" RF Magnetron Sputtering

[Example] "Particle-PLUS" RF Magnetron Sputtering

Introduction to Particle-PLUS Analysis Case: "RF Magnetron Sputtering Analysis" Simulation Case

This is an analysis case of RF magnetron sputtering, which is one of the film deposition methods using process plasma. Particle-PLUS specializes in plasma analysis within vacuum chambers and can perform simulations of deposition rates and other parameters at high speed. ◇ Features of 'Particle-PLUS' - Excels in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, it can obtain results quickly without the need for full device simulations. - Specializes in plasma simulations for low-pressure gases, where fluid modeling is difficult. - Supports 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing efficient analysis even for complex models. - As a strength of our in-house developed software, customization to fit customer devices is also possible. ◆ Various calculation results can be output ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas and more. *Please feel free to contact us for more details.

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  • Other analytical equipment

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[Case Study] Particle-PLUS: RF Magnetron for Dielectric Targets

[Case Study] Particle-PLUS: RF Magnetron for Dielectric Targets

Particle-PLUS Analysis Case Introduction: "RF Magnetron Sputtering Analysis of Dielectric Targets" Simulation Case

This is an analysis case of RF magnetron sputtering, which is one of the film deposition methods using process plasma. Particle-PLUS specializes in plasma analysis within vacuum chambers and can perform simulations of deposition rates and more at high speed. ◇ Features of 'Particle-PLUS' - Excels in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, results can be obtained quickly without the need for full device simulations. - Specializes in plasma simulations in low-pressure gases, where calculations with fluid models are challenging. - Supports 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing for efficient analysis of complex models. - As a strength of our in-house developed software, customization to fit the customer's equipment is also possible. ◆ Various calculation results can be output ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the walls - Energy spectrum of electrons and ions at the walls - Density distribution/temperature distribution/velocity distribution of neutral gas and more. *Please feel free to contact us for more details.

  • Scientific Calculation and Simulation Software
  • Other Software
  • Other analytical equipment

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[Example] Particle-PLUS AC Magnetron Sputtering

[Example] Particle-PLUS AC Magnetron Sputtering

Introduction of analysis examples using "Particle-PLUS": "AC Magnetron Sputtering Simulation"

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, it can quickly obtain results without the need to simulate the entire device. - It excels in plasma simulations for low-pressure gases, where calculations using fluid models are challenging. - It supports 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing efficient analysis even for complex models. - As a strength of our in-house developed software, customization to fit the customer's device is also possible. ◆ Supports various applications ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

  • Scientific Calculation and Simulation Software
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  • Other analytical equipment

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High-speed plasma analysis software 'Particle-PLUS/DL'

High-speed plasma analysis software 'Particle-PLUS/DL'

Generate machine learning data from CAE analysis models! Software that allows easy execution of calculation results in plasma analysis.

"Particle-PLUS/DL" is a CAE surrogate model software that addresses the challenges of traditional plasma simulations. It combines deep learning, which is gaining attention as the "fourth science," with CAE. It enables parametric studies through high-speed calculations, making it useful in the initial examination of plasma analysis. Additionally, it generates training data for machine learning from CAE analysis models, allowing for analysis even without a large amount of experimental data. 【Features】 ■ Results can be confirmed in a few seconds ■ Simple and easy-to-understand GUI ■ Plasma analysis is possible even without a large amount of experimental values ■ Does not diverge ■ Compatible with Windows 10 machines *For more details, please refer to the PDF document or feel free to contact us.

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Semiconductor plasma analysis software 'Particle-PLUS'

Semiconductor plasma analysis software 'Particle-PLUS'

"Particle-PLUS" is a plasma and rarefied fluid analysis software that excels in ICP and CCP analysis using particle methods.

"Particle-PLUS" is software suitable for research and development of devices using plasma, compatible with ICP and CCP. - Excels in simulations of low-pressure gases where fluid modeling is challenging. - Calculation functions for inductive heating for ICP simulations. - Advanced physical model analysis such as CCP and external circuit models. - Capable of simultaneously simulating ICP and CCP. - Supports 2D and 3D, efficiently analyzing even complex models. - As a strength of our in-house developed software, customization to fit customer devices is possible. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD), etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us at sales@wavefront.co.jp.

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  • Other analytical equipment

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