Microfabrication, research and development, industrial high-power ultrashort pulse laser PHAROS
Simultaneously achieving high output and high energy of femtosecond lasers enables high-quality, high-precision fine processing at high speed due to high repetition operation and stable emission direction.
Excellent beam quality, stability of emission direction, and low running costs make it ideal for microfabrication and micromachining. Equipped with pulse width and output variable functions, as well as pulse-on-demand capabilities, it allows for easy changes to laser irradiation conditions, making it perfect for application development and equipment integration. Additionally, leveraging high pulse repetition frequency and high average output contributes to improved S/N and significant reductions in measurement time, benefiting the fields of physics and research and development. By combining PHAROS (high average output of 20W @ 1MHz) with ORPHEUS (OPA) and wavelength extension units, it enables wavelength variability up to 16μm, making it suitable for spectral analysis and more. Furthermore, high output and high energy types (20W, 4mJ/pulse @ 3kHz) and ultra-short pulse width types (>100fs) have been added, making it ideal for various processing, application development, and equipment integration. A high-output ultra-short pulse (femtosecond) laser has achieved significant miniaturization and low power consumption through direct excitation of laser diodes. It features pulse width and output variable functions, as well as pulse-on-demand capabilities, allowing for easy changes to laser irradiation conditions.
- Company：フォトテクニカ
- Price：Other
