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  6. Microfabrication, research and development, industrial high-power ultrashort pulse laser PHAROS

Microfabrication, research and development, industrial high-power ultrashort pulse laser PHAROS

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PHAROS by Light Conversion.

last updated:Jul 08, 2024

フォトテクニカ
フォトテクニカ
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Simultaneously achieving high output and high energy of femtosecond lasers enables high-quality, high-precision fine processing at high speed due to high repetition operation and stable emission direction.

Excellent beam quality, stability of emission direction, and low running costs make it ideal for microfabrication and micromachining. Equipped with pulse width and output variable functions, as well as pulse-on-demand capabilities, it allows for easy changes to laser irradiation conditions, making it perfect for application development and equipment integration. Additionally, leveraging high pulse repetition frequency and high average output contributes to improved S/N and significant reductions in measurement time, benefiting the fields of physics and research and development. By combining PHAROS (high average output of 20W @ 1MHz) with ORPHEUS (OPA) and wavelength extension units, it enables wavelength variability up to 16μm, making it suitable for spectral analysis and more. Furthermore, high output and high energy types (20W, 4mJ/pulse @ 3kHz) and ultra-short pulse width types (>100fs) have been added, making it ideal for various processing, application development, and equipment integration. A high-output ultra-short pulse (femtosecond) laser has achieved significant miniaturization and low power consumption through direct excitation of laser diodes. It features pulse width and output variable functions, as well as pulse-on-demand capabilities, allowing for easy changes to laser irradiation conditions.

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PHAROS-PH2-Femtosecond-Laser-_-G54_9582-768x480

Microfabrication, research and development, industrial high-power ultrashort pulse laser PHAROS

PHAROS-PH2-Femtosecond-Laser-_-G54_9582-768x480 のコピー.jpg
PHAROS-PH2-Femtosecond-Laser-_-G54_9582-768x480 のコピー.jpg
  • Related Link - https://www.phototechnica.co.jp/products/laser-osc…

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basic information

High output and high pulse repetition enable high-quality, high-precision nano-processing at high speeds. When combined with the specially developed OPA (ORPHEUS), it provides wavelength tuning capabilities with high repetition rates, high energy, and high beam quality output. Features: ● Central wavelength: 1030±10nm ● Maximum average output: 20W (★PH2-4mJ model: 20W, >4mJ, <450fs) (★PH2-UP model: 20W, <100fs, 0.4mJ) ● Pulse width: variable from 100fs to 10ps (20ps possible) ● Variable pulse repetition frequency: single shot to 1MHz ● Maximum pulse energy: 4mJ ● High-quality beam quality: TEM00: M2<1.2 ● One-box shielded package ● Built-in pulse picker allows pulse-on-demand operation ● Robust, industrial-grade mechanical design ● Advanced thermal stabilization system ● Short warm-up time ● Low running costs ● Harmonic options that can be directly attached to the laser head (automatic switching: 515nm, 343nm, 257nm, 206nm)

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Features ● Center wavelength: 1030±10nm ● Maximum average output: 20W (★PH2-4mJ model: 20W, >4mJ, <450fs) (★PH2-UP model: 20W, <100fs, 0.4mJ) ● Pulse width: variable from 100fs to 10ps (20ps possible) ● Variable pulse repetition frequency: single shot to 1MHz ● Maximum pulse energy: 4mJ ● High-quality beam quality: TEM00: M2<1.2 ● One-box shielded package ● Built-in pulse picker enables pulse-on-demand operation ● Robust, industrial-grade mechanical design ● Advanced thermal stabilization system ● Short warm-up time ● Low running costs ● Harmonic options directly attachable to the laser head (automatic switching: 515nm, 343nm, 257nm, 206nm)

Detailed information

  • PHAROS-PH2-Femtosecond-Laser-_-G54_9582-768x480.jpg

    ★BiBurst (the possibility of variable GHz/MHz bursts through burst-in-burst operation) option By adding a flexible BiBurst function to the high-energy femtosecond laser PHAROS, new production possibilities can be opened up in innovative high-tech manufacturing industries (home appliances, IC chip manufacturing, stent cutting, surface functionalization, next-generation display factories, quantum computers, etc.). Scalability in material processing: ◆ Hole processing and cutting of brittle materials ◆ Deep engraving ◆ Material selection ablation ◆ Internal processing of transparent materials

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フォトテクニカ

フォトテクニカ

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Our company started with the import and sales of laser oscillators and optical devices and components, and has developed through the import and sales of innovative and original electronic optical devices from around the world, as well as the provision of advanced technical services. Our main products include a variety of laser light sources ranging from semiconductor lasers to nano, pico, and femtosecond lasers, along with various devices and measurement instruments for their adjustment and control. In the field of optical spectroscopy and analysis, we offer high-performance multi-spectral fiber-coupled spectrometers and their application measurement systems (color, luminescence, absorption, Raman spectroscopy, fluorescence, plasma, LIBS, etc.), as well as thermal imaging IR cameras. Furthermore, in response to the development of thin film technology, we handle thin film measurement instruments such as thin film adhesion strength testers and optical interference film thickness monitors. Moving forward, we will enhance various applications and after-sales services to respond quickly to user demands. We will continue to firmly establish ourselves in the fields of light and nanotechnology, adapting to market trends and aiming for further development as a frontier trading company that serves everyone.

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