etching Product List and Ranking from 6 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

etching Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. 日鉄ステンレスアート 旧月星アート工業株式会社 Hyogo//Building materials, supplies and fixtures manufacturers
  2. フォトプレシジョン Tokyo//others
  3. 豊和産業 Tokyo//Trading company/Wholesale
  4. エスジー工業 Tokyo//Trading company/Wholesale
  5. トーホー 本社 Hyogo//others
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etching Product ranking

Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. Etching of stainless steel plates 日鉄ステンレスアート 旧月星アート工業株式会社
  2. Introduction to Glass Etching Processing Technology フォトプレシジョン
  3. Introduction to Silicon Etching Processing Technology フォトプレシジョン
  4. Braille etching トーホー 本社
  5. 4 Silicon etching フォトプレシジョン

etching Product List

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Introduction to Glass Etching Processing Technology

Introduction to Glass Etching Processing Technology

Corrode the surface of the glass with chemicals such as hydrofluoric acid!

"Glass etching" is a processing technique that involves corroding the surface of glass with chemicals such as hydrofluoric acid to create grooves and relief patterns. As substrate materials, quartz and borosilicate glass such as BK7 are used. Additionally, a metal thin film patterned by photolithography is used as a mask, allowing for the formation of high-precision patterns. 【Features】 - Uses quartz and borosilicate glass such as BK7 as substrate materials - Utilizes a metal thin film patterned by photolithography as a mask - Capable of forming high-precision patterns - Dimension control in the depth direction is possible - The surface finishes relatively smoothly *For more details, please refer to the catalog or feel free to contact us.

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Introduction to Silicon Etching Processing Technology

Introduction to Silicon Etching Processing Technology

By selecting the type of crystal orientation, you can choose the type of groove processing!

"Silicon etching" is a processing technology that corrodes the silicon substrate itself to form three-dimensional structures. There are two types of silicon corrosion: one that progresses in a specific direction (anisotropic) and one that progresses in all directions (isotropic). When performing anisotropic etching, single-crystal silicon is used for the substrate, and an etching solution such as KOH aqueous solution is employed. Single-crystal silicon wafers are categorized by crystal direction, and by selecting this, the type of groove processing can be chosen. Additionally, isotropic etching can also be performed depending on the type of etching solution used. [Features] - Corrodes the silicon substrate itself to form three-dimensional structures - Allows selection of groove processing types by choosing the type of crystal direction - Isotropic etching is also possible depending on the type of etching solution *For more details, please refer to the catalog or feel free to contact us.

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Braille etching

Braille etching

The technology of braille etching is a patented product of Toho! The integration of patterns and braille enhances design quality!

The technology of dot engraving is a patented product of our company, which, unlike traditional embossing methods, allows for the creation of highly designed braille plates by integrating patterns and braille. For more details, please contact us or download the catalog.

  • Steel construction

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Etching of stainless steel plates

Etching of stainless steel plates

By etching, you can create high-definition reliefs on stainless steel surfaces to express designs, patterns, and textures such as design drawings and photographs.

After using screen printing technology and photo-plate technology to print and transfer pattern diagrams or images onto stainless steel plates, the areas not masked are dissolved with etching solution to create fine unevenness, expressing designs and textures on the stainless steel plates. When coloring etched stainless steel with fine colors or Noies, the shadows of the fine unevenness are enhanced, making the etched patterns stand out even more. The etching methods include general printing etching and photo etching, which allows for high-definition expression. *If you provide digital data, we can also create custom designs for etching as per your request. *For more details, please refer to the catalog or feel free to contact us.

  • Elevator
  • Interior wall decoration

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Silicon etching

Silicon etching

Silicon etching

Introducing Photoprecision, a company that contributes to prototyping and development in various fields, including microelectronics and optics, with photofabrication as its core technology. "Silicon Etching" Overview A technology that corrodes the silicon substrate itself to form three-dimensional structures. ■□■ Features ■□■ ■ Utilizes the crystal orientation of silicon to achieve flat-walled grooves (anisotropic etching). Can form V-shaped and rectangular grooves. ■ Depending on the type of etching solution, rounded edges can be created on the groove walls, allowing for isotropic etching as well. ■□■ Types of Processing ■□■ ■ V-Groove Processing - Using silicon material with a <100> surface orientation, V-shaped grooves are formed. - The angle of the slope remains constant (54.7°). ■ Rectangular Groove Processing - Using silicon material with a <110> surface orientation, rectangular grooves are formed. - Due to the crystal structure, the orientation of the grooves tilts at 54.7° to the side. ■ Isotropic - Etching progresses uniformly in all directions. ■ For more details, please download the catalog or contact us.

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Etching

Etching

It is suitable for protecting wires on the edges of panels and chassis, as well as straight edge parts!

We would like to introduce the "etching" handled by SG Industrial Co., Ltd. Made of polyamide resin (Nylon 6) with excellent wear resistance and electrical insulation, it provides strong protection for wires and similar items. It can be easily installed by simply fitting it in place. Additionally, it can be cut to any desired size, making it economical. We also accept custom cutting to your preferred length. 【Specifications (excerpt)】 ■Part number: SE-012 ■Applicable panel thickness: 1.0 to 1.2 ■Standard length (m): 1 *For more details, please refer to the PDF document or feel free to contact us.

  • Safety and consumables

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Metal Etching | Supports Fine Text

Metal Etching | Supports Fine Text

Our unique wet etching technology allows for detailed text and relief expression.

Etching processing is a technique that expresses letters and designs by creating unevenness on the surface of metal through corrosion. Our company utilizes a unique wet etching technology to accommodate detailed letters and logos. 【Leave the production of nameplates to us!】 With over 70 years of accumulated technology and know-how, we respond flexibly to our customers' requests. ■ Our strength lies in our flexible response utilizing in-house integrated production! Even if the specifications seem "difficult," please consult with us once. Our sales representatives and engineers collaborate for each inquiry to provide speedy responses. ■ We accept orders starting from one piece! We welcome orders for mass production as well as single pieces. Feel free to consult us for prototype production. ■ Data creation support! We can create drafts from design drawings at the planning stage or even from handwritten sketches.

  • Sign construction

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Photo etching

Photo etching

We accept small-scale prototypes using precision photolithography technology for fine processing.

We accept small-scale prototypes using photolithography and precision phototechnology, which are essential technologies in MEMS and display devices. We form thin films on substrates such as glass substrates, silicon wafers, films, and ceramics, and create fine patterns through a consistent photolithography process. We can accommodate prototypes starting from a single piece. We also support prototypes for dicing, bump formation, and more. Additionally, patterning of dielectric films and multilayer films is possible through lift-off processing. Substrate sizes can be customized. Etching of silicon wafers and glass substrates is also available. We can respond with short lead times (consultation required), and we support both rigid and flexible printed circuit (FPC) substrates. For more details, please contact us or refer to our catalog.

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