Silicon etching

basic information

Introducing Photoprecision, a company that contributes to prototyping and development in various fields, including microelectronics and optical products, with photofabrication as its core technology. "Silicon Etching" Overview A technology that corrodes the silicon substrate itself to form three-dimensional structures. ■□■ Features ■□■ ■ Utilizing the crystal orientation of silicon, it enables the creation of groove processing with flat groove walls (anisotropic etching). V-shaped and rectangular grooves can be formed. ■ Depending on the type of etching solution, rounded edges can be created on the groove walls, allowing for isotropic etching as well. ■□■ Types of Processing ■□■ ■ V-Groove Processing - Using silicon material with a <100> surface orientation, V-shaped grooves are formed. - The angle of the slope is always the same (54.7°). ■ Rectangular Groove Processing - Using silicon material with a <110> surface orientation, rectangular grooves are formed. - Due to the crystal structure, the direction of the grooves tilts at 54.7° to the side. ■ Isotropic - Etching progresses equally in all directions. ■ For more details, please download the catalog or contact us.

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Applications/Examples of results

■□■Applications■□■ ■Fiber array ■Devices for MEMS (mirrors) ■Microdevices, etc.