[Analysis Case] Exploration of Optimal Conditions for CVD Etching Process
For exploring optimal conditions! Here are examples of utilizing multi-dimensional display charts!
We will introduce a case study of exploring optimal conditions for the etching process, coupled with the detailed chemical reaction analysis program CHEMKIN. In the problem setup, we varied the raw gas supply amount (SCCM) and oxygen concentration to find the operating point where the outlet C2F6 concentration and CF4 concentration are minimized, while maximizing the etching rate (minimizing the film formation rate). As a result of the calculations, it became clear that there is a trade-off relationship between C2F6 concentration and etching rate. Subsequently, we successfully extracted preferred solutions from the multidimensional display chart of "modeFRONTIER." [Case Study] ■ Software Used: modeFRONTIER, CHEMKIN ■ Objective: Exploration of optimal conditions for the etching process ■ Effect: Comparison of preferred solutions using a multidimensional display chart *For more details, please refer to the external link or feel free to contact us.
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