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Plasma analysis of the Particle-PLUS simultaneous sputtering device.

Plasma analysis of the Particle-PLUS simultaneous sputtering device.

Analysis of dual magnetron sputtering considering the accurate shape is possible.

The particle method plasma analysis software 'Particle-PLUS', developed by Wavefront Inc., can analyze simultaneous magnetron sputtering in devices where the substrate and target are not in equilibrium. With the cut cell creation function, it allows for high-precision electric field calculations characteristic of orthogonal grids while considering accurate shapes and normal directions. *For more details, please download the PDF or feel free to contact us.*

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Easy fluid analysis with CAD: "Simerics MP for SW"

Easy fluid analysis with CAD: "Simerics MP for SW"

Advanced analysis can be easily performed on SOLIDWORKS! For shortening development time and reducing costs!

"Simerics MP for SOLIDWORKS" is a CAD-integrated thermal fluid analysis software that can be operated within SOLIDWORKS. Integrated into the SOLIDWORKS GUI, designers can perform everything from design to analysis themselves. The calculation settings are also simple, allowing for quick mastery of the operation. By enabling designers to conduct various analyses, such as examining optimal shapes, identifying the causes of problems, and verifying performance—tasks that were traditionally outsourced—this leads to reduced development time, improved quality, and cost savings. 【Features】 ■ Supports a wide range of simulations including flow, turbulence, heat conduction, and convection ■ Automatically generates computational meshes directly from CAD surfaces ■ Extremely fast, accurate, and robust solver ■ Stable iterative calculations for very challenging problems, such as micro-meter scale geometries ■ Accurate calculation results that show excellent correlation with physical tests *For more details, please refer to the materials. Feel free to contact us with any inquiries.

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Analysis of thin film formation on Particle-PLUS microtrench

Analysis of thin film formation on Particle-PLUS microtrench

It is possible to analyze the film formation process from both macro and micro scales.

The particle method plasma analysis software "Particle-PLUS," developed by Wavefront Inc., can analyze magnetron sputtering even in cases where there are micro trenches on the substrate. "Particle-PLUS" is capable of simulating the film deposition process by calculating both the macro scale of the entire sputtering device on a substrate that includes micro trenches and the micro scale concerning the micro trenches! *For more details, please download the PDF or feel free to contact us.

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