Analysis of dual magnetron sputtering considering the accurate shape is possible.
The particle method plasma analysis software 'Particle-PLUS', developed by Wavefront Inc., can analyze simultaneous magnetron sputtering in devices where the substrate and target are not in equilibrium. With the cut cell creation function, it allows for high-precision electric field calculations characteristic of orthogonal grids while considering accurate shapes and normal directions. *For more details, please download the PDF or feel free to contact us.*
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【Specifications】 ■Product Name: Particle-PLUS ■Price Range: Please contact us ■Delivery Time: Please contact us *For more details, please download the PDF or feel free to contact us.
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【Calculable Cases】 ■ Magnetron Sputtering ■ PVD, Plasma CVD ■ Capacitive Coupled Plasma (CCP) ■ Electrophoresis, etc. 【Features】 ■ Specializes in low-pressure plasma analysis ■ Combines axisymmetric models with mirror-symmetric boundary conditions to quickly obtain results without simulating the entire device ■ Excels in plasma simulation for low-pressure gases, which are difficult to compute with fluid models ■ Supports both 2D and 3D, allowing efficient analysis even for complex models ■ As a strength of our in-house developed software, customization to fit customer devices is also possible *For more details, please download the PDF or feel free to contact us.
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