High-speed measurement of film thickness distribution!
The FALCO film thickness 2D mapping system is a system that can measure the thickness distribution of thin films formed mainly on glass or semiconductor wafers quickly and with high resolution. Depending on the conditions, it can accurately determine values from thin films of a few nanometers to relatively thick areas on the order of micrometers (equivalent to silicon).
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basic information
Resolution: 0.001 nm Accuracy: NIST compliant wafer 1000 nm < ±1% Reproducibility: 0.01 nm (active layer), 0.04 nm (BOX layer), 3σ (example of SOI wafer) Long-term stability: 0.01 nm (active layer), 0.04 nm (BOX layer) 3σ (average) (example of SOI wafer) Throughput: 60 wafers/hour (300mm wafer, 1mm spatial resolution) *Varies depending on the type of layer and spatial resolution. Spatial resolution: Up to 0.2 mm (300 mm wafer)
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Applications/Examples of results
Measurement of the thickness of various layers such as oxide films, nitride films, and SOI 100% inspection at the time of shipment Monitoring and research and development of the film formation process
Company information
Optosirius is a technical trading company that imports and sells spectrometers, measuring instruments, and optical components. Our main product line features compact spectrometers from Ocean Optics, which boasts one of the largest market shares in the world. Additionally, we handle high-brightness LED products, compact Raman measuring instruments, multispectral sensors/multispectral cameras, compact color luminance meters capable of high-speed data acquisition, switches compatible with multimode optical fibers, materials such as quantum dots, and optical components like infrared detectors. A list of manufacturers we represent as authorized import agents, along with detailed information on each manufacturer's products, can be found on our company website.
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