100% focus on BATCHSPRAY technology! Significantly reduce water, exhaust, and chemicals [Wet chemical equipment for the semiconductor industry].
This 3-chamber system utilizes a patented retainer comb processing system, accommodating all types of wet etching processes and cleaning applications. The combination of acid/cleaning allows for high process flexibility and high throughput. By using SicOzone instead of peroxides or sulfuric acid for sustainable processes such as cleaning and resist stripping, it can reduce the consumption of chemicals and deionized water by up to 90%. 【Features】 ■ Throughput of up to 400 wph ■ Two cleaning process chambers ■ Uniformity with less than 1% variation ■ Installation area of less than 12 m² ■ Chemical recirculation through a tank system ■ EPD - End Point Detection *For more details, please refer to the PDF document or feel free to contact us.
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【Products Offered】 ■BATCHSPRAY Clean Autoload ■BATCHSPRAY Acid Autoload ■BATCHSPRAY Solvent Autoload ■BATCHSPRAY Acid/Solvent Autoload ■BATCHSPRAY Acid/Clean Autoload ■BATCHSPRAY Acid ■BATCHSPRAY Solvent *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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Siconnex, headquartered in Europe, is a global manufacturer of wet chemical equipment for the semiconductor industry and related fields. We provide BATCHSPRAY equipment for preparing the surfaces of a wide range of end products, including MEMS, power semiconductors, analog/mixed-signal semiconductors, and III-V semiconductors. Our equipment establishes industry standards through safety, automation, compact footprint, high throughput, and efficient use of economic resources. There is a growing demand for our solutions as follows: - Environmentally friendly: Cleaning and resist stripping with ozone - Optimal for small quantities and diverse products with a small footprint for various processes - Automatic detection of etching endpoint with EPD