Semiconductor Device BATCHSPRAY Solvent Autoload

100% focus on BATCHSPRAY technology! Significantly reduces water, exhaust, and chemicals [Wet chemical equipment for the semiconductor industry] Fully automatic equipment.

This two-chamber system not only provides excellent etching uniformity but also reduces chemical usage. It accommodates all types of wet etching processes. It includes high-precision mixing of chemicals within the tank, endpoint detection (EPD), and a patented retainer comb processing system. Furthermore, the SicOzone resist strip can be applied in the same chamber, which not only enhances flexibility but also reduces processing steps. 【Features】 ■ Throughput of up to 300 wph ■ Two process chambers ■ Uniformity with less than 1% variation ■ Installation area of less than 12 m² ■ Chemical recirculation via tank system ■ Process execution possible with sic/GaN *For more details, please refer to the PDF document or feel free to contact us.

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