It is possible to achieve a reduction in the number of defects on the substrate! The reduction of "surface defects" can be reliably achieved.
This product is a polishing pad for final polishing manufactured by FILWEL Co., Ltd. (formerly Kanebo). By combining fine cerium oxide abrasives and colloidal silica, it achieves a high-quality surface with fewer defects. Currently, there are a total of four varieties in the series, with an "Asker-C hardness" level of "53." This product reliably reduces the "number of surface defects," which is considered unacceptable in the mask world. 【Lineup】 ■N7512 ■N0012 ■N0092 ■N0192 *For more details, please feel free to contact us.
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Since its establishment in 1937 (Showa 12), Yachiyo Micro Science has been a specialized trading company for grinding and polishing materials, while also continuously engaging in product development related to grinding and polishing through its research and development department. We also operate the technical information sites "Grinding and Polishing .COM" and "Aglutinants .COM." Please take a look.
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