Tohoku University Technology: Layered nanosheet: T20-3099

High-quality layered MoS2 and Layered graphite at a lower cost than conventional technologies

MoS2 is attracting attention as the material for next-generation nanodevices with low power consumption and new functionality. Current fabrication methods include intercalation, which is a method of inserting ions to widen the interlayer distance and exfoliate, and chemical vapor deposition (CVD), which is a method of depositing a film on the surface of a substrate by supplying a source gas containing thin film components, but the former is of low quality and the latter is expensive and less productive.　 　This invention relates to a method for producing novel layered nanosheets of high quality, such as low cost, low interlayer residue and high orientation, which solve the above problems. Examples of producing layered nanosheets are MoS2 and graphite, but other layered nanosheets can also be produced.

others