Analysis software capable of analyzing gas flow under low pressure conditions, such as vacuum exhaust simulation, and compatible with rarefied gases (rarefied fluids).
**Features** - Adopts unstructured mesh, allowing for calculations that reflect the complex shapes of actual devices. - High parallel efficiency enables quick computation results even for large-scale shapes. - Utilizes a particle method, ensuring convergence solutions even with poor-quality computational grids, unlike fluid models. - Comprehensive technical support allows beginners in simulation and those busy with experiments to reliably achieve results. **Supports Various Cases** - Simulation of rarefied gas flow in a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Chemical vapor deposition (CVD), organic light-emitting diode (OLED), molecular beam epitaxy (MBE). - Film deposition simulations involving chemical reactions like CVD. **Outputs Various Calculation Results** - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions. - Ability to set multiple reaction equations on the GUI. *For more details, please refer to the catalog or feel free to contact us.*
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basic information
【Features】 ● A simulation software for dilute fluid using the particle method, useful for experiments and equipment development using vacuum chambers. ● Capable of simulating film deposition rates and distributions that include chemical reactions such as CVD. ● Adopts unstructured meshes, allowing for calculations that reflect the actual shape of the equipment. ● High parallel efficiency enables quick computation results even for large-scale shapes. ● Since it uses the particle method, unlike fluid models, it can achieve convergent solutions even with poor-quality computational grids. ● With comprehensive technical support, even those new to simulations or busy with experiments can reliably obtain results. ● For other features and details, please refer to the catalog.
Price information
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Applications/Examples of results
◆ Organic EL (OLED) Simulation * Uniformity of film deposition rate, optimization of shape, temperature dependence of organic material deposition distribution in organic EL simulation, etc. ◆ Molecular Beam Epitaxy (MBE) Simulation * Optimization of molecular beam cell shape, uniformity of deposition distribution, concentration distribution in molecular beam epitaxy simulation, etc. ◆ Showerhead-type CVD (Chemical Vapor Deposition) * Evaluation of film deposition rate * Evaluation of film uniformity * Distribution of radicals affecting film growth in the gas phase * Concentration distribution on the substrate surface * Evaluation of gas flow rate and flow volume entering the chamber from the showerhead section ◆ Vacuum Pump Exhaust Simulation * Temperature and cross-sectional area dependence of conductance, effects of gas pockets and outgassing, etc. ◆ Behavior of Macroparticles (Dust) * Effects of macroparticles within the chamber, etc. ◆ Hypersonic Rarefied Flow * Density and temperature distribution around objects, effects of chemical reactions, etc. ◆ Shock Waves ◆ Benard Convection ◆ Behavior of Dust in the Chamber * Effects of dust on films, considering the influence of gravity.
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Company information
Our company develops and sells a "Maintenance Management System" for managing and operating various plants, factories, and other facilities and assets. Currently, this system is undergoing significant evolution into a system that incorporates IoT technologies, such as sensor information and input from tablet devices, as well as AI technologies like machine learning, featuring functions for failure prediction and automatic scheduling. Additionally, as part of the recent trend of digital transformation (DX), there is a growing movement to digitize and automate manufacturing processes and research and development sites in factories to improve operational efficiency. In line with this trend, our company provides a solution aimed at enhancing efficiency in research and development environments, which is the Laboratory Information Management System (LIMS). This software includes features such as workflow management, data tracking, data management, data analysis, and integration of electronic lab notebooks.
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