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  6. HVPE (Hydride Vapor Phase Epitaxy) equipment for GaN self-sustaining substrate growth

HVPE (Hydride Vapor Phase Epitaxy) equipment for GaN self-sustaining substrate growth

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last updated:Aug 07, 2023

Fテクニカルサポート
Fテクニカルサポート
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Leave it to us for anything related to semiconductor equipment.

The "GaN Self-Supporting Substrate Growth HVPE Device" is a system that utilizes a substrate rotation mechanism developed uniquely by our company. The heater features a split-type 12-zone control. It employs a total control system from MicroLogic. Please feel free to contact us if you have any inquiries. 【Device Configuration】 ■ 3 inches x 3 pieces (MAX) ■ Split-type 12-zone control ■ N2 atmosphere loading BOX ■ Substrate rotation mechanism ■ Automatic opening and closing movable heater ■ Equipped with a total control system *For more details, please download the PDF or feel free to contact us.

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装置.PNG

HVPE (Hydride Vapor Phase Epitaxy) equipment for GaN self-sustaining substrate growth

装置.PNG
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  • Related Link - https://www.ftsj.co.jp/ecology1.html

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【Related Products】 ■ Ammonia Removal Device ■ Cylinder Cabinet *For more details, please download the PDF or feel free to contact us.

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HVPE (Hydride Vapor Phase Epitaxy) equipment for GaN self-sustaining substrate growth

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Our company supports equipment engineering through maintenance, refurbishment (repair, modification, and regeneration), design, manufacturing, assembly, installation, and adjustment of semiconductor and IT-related devices. We prioritize making our customers happy with the parts and equipment we create, and we work diligently and sincerely every day. Please feel free to contact us if you have any requests.

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HVPE (Hydride Vapor Phase Epitaxy) equipment for GaN self-sustaining substrate growth
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HVPE (Hydride Vapor Phase Epitaxy) equipment for GaN self-sustaining substrate growth
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