Utilizing strong oxidation effects! Examination of film quality when irradiating with VUV light under varying irradiation conditions.
A method for obtaining silica films through relatively low-temperature heat treatment has been reported, which involves firing ceramic precursor polymers such as perhydropolysilazane in the atmosphere or in water vapor at a temperature of around 450°C. This study aimed to utilize the strong oxidative action of active oxygen species to convert PHPS, which does not contain oxygen unlike TMOS and TEOS, into silica at low temperatures. To investigate the effects of oxygen concentration in the irradiation atmosphere during thin film formation and the necessity of bond cleavage due to photon energy, we examined the film quality when VUV light was irradiated on spin-coated films using PHPS solution under varying irradiation conditions. [Contents] ■ Introduction ■ Experiment ■ Results and Discussion ■ Conclusion *For more details, please refer to the PDF document or feel free to contact us.
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Quark Technology Co., Ltd. manufactures and sells various industrial equipment utilizing cutting-edge optical application technology. Through the development of vacuum ultraviolet and UV-LED light sources, we have introduced manufacturing technologies for semiconductor production, as well as new displays such as LCDs, PDPs, films, and EL, along with various electronic materials and devices. Additionally, we are planning research and development to address the demand for waste and environmental management equipment, which are pressing medical and social issues. All substances are composed of atoms, nucleons, and "quarks." At Quark Technology, we continue to research light and challenge ourselves in industrial application technologies.
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