Technical Data: Formation of Silica Thin Films Using Perhydropolysilazane

Utilizing strong oxidation effects! Examination of film quality when irradiating with VUV light under varying irradiation conditions.

A method for obtaining silica films through relatively low-temperature heat treatment has been reported, which involves firing ceramic precursor polymers such as perhydropolysilazane in the atmosphere or in water vapor at a temperature of around 450°C. This study aimed to utilize the strong oxidative action of active oxygen species to convert PHPS, which does not contain oxygen unlike TMOS and TEOS, into silica at low temperatures. To investigate the effects of oxygen concentration in the irradiation atmosphere during thin film formation and the necessity of bond cleavage due to photon energy, we examined the film quality when VUV light was irradiated on spin-coated films using PHPS solution under varying irradiation conditions. [Contents] ■ Introduction ■ Experiment ■ Results and Discussion ■ Conclusion *For more details, please refer to the PDF document or feel free to contact us.

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